Application

Power Device

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Manufacturing Process

SiC

SiC Epitaxial Growth | SiC Power Devices Manufacturing Process

SiO2 mask depostion by plasma cvd system| SiC Power Devices Manufacturing Process

SiO2 Dry Etching | SiC Power Devices Manufacturing Process

Ion Implant and Annealing | SiC Power Devices Manufacturing Process

SiO2 Mask Removal | SiC Power Devices Manufacturing Process

SiO2 Mask deposition by plasma cvd system| SiC Power Devices Manufacturing Process

SiO2 Film Etching by ICP etching system| SiC Power Devices Manufacturing Process

SiC Etching by ICP etching system| SiC Power Devices Manufacturing Process

SiO2 Mask Removal| SiC Power Devices Manufacturing Process

SiO2 film Deposition by plasma cvd system | SiC Power Devices Manufacturing Process

SiO2 etching by IPC etching system | SiC Power Devices Manufacturing Process

Electrode Formation | SiC Power Devices Manufacturing Process

GaN

GaN Epitaxial Growth | GaN Power Device Manufacturing Process

Power Device Separation by ICP etching system | GaN Power Device Manufacturing Process

Gate Recess Formation by ICP Etching | GaN Power Device Manufacturing Process

Insulation Film (SiO2) Deposition by Plasma CVD system | GaN Power Device Manufacturing Process

SiO2 Etching by ICP Etching System | GaN Power Device Manufacturing Process

Electrode Formation | GaN Power Device Manufacturing Process

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