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Company
> History
| 1979 | September | SAMCO International, Inc. was established |
|---|---|---|
| 1980 | July | Released large CVD System for semiconductor process |
| 1981 | April | Released Japan's first MO-CVD system |
| 1984 | July | Opened Tokyo branch office |
| 1985 | June October |
Moved HQ to current location. Started to sell March Instrument (now Nordson) products Opened Tokyo sales office |
| 1987 | February | Opened OPTO Films Research Laboratory in Sunnyvale, California |
| 1990 | January November |
Opened Kanagawa office Released LS-CVD system for processing of SiO2 film |
| 1991 | March December |
Opened Research and Development Center in Fushimi-ku, Kyoto Opened second Production Facility in Fushimi-ku, Kyoto |
| 1993 | February September |
Opened Tsukuba office Opened Tokai office |
| 1994 | February | Released CVD system for ferroelectric film using the technology from Symmetric Corporation |
| 1995 | July December |
Developed CFC detoxifying technology Released small etching system, the RIE-10NR |
| 1996 | December | Released ICP etching system, the RIE-101iP |
| 1997 | January January |
Developed technology for DLC coating on PET bottles Released ICP system, the RIE-200iP |
| 1998 | March November December |
Opened Hiroshima office Released mass production ICP system, the RIE-101iPC Released CVD system, the PD-220 |
| 1999 | July | Acquired Service Department of SAMCO Engineering Inc |
| 2000 | January May |
Opened research laboratory in Cambridge University Released mass production type plasma cleaning system, the PXA-200N |
| 2001 | May July October |
Listed SAMCO's share on JSDA Opened Taiwan office Opened Sendai office |
| 2003 |
November December | Released mass production type CVD system, the PD-220LC Introduced Bosch Process |
| 2004 | November December |
Opened Shanghai Office Changed company name to SAMCO Inc. Reduced the mandatory unit of transaction from 1,000 to 100 Moved SAMCO's shares from JSDA to JASDAQ |
| 2005 | February May |
Created Mass Production System Division Released CVD system, the PD-2203L (ClusterLab) |
| 2006 | March May September |
Created Product Support Center Released Deep RIE system, the RIE-800iPB for MEMS Signed on Collaboration Research with Tsinghua University of China |
| 2007 | November | Released RIE-140iP/iPC for Laser Diode processing |
| 2008 | March May August November |
Opened the second Research and Development Center in Fushimi-ku, Kyoto Released MO-CVD system, MCV-2018 Opened South Korea office Released Model RIE-330iPC |
| 2009 | January April October |
Established SAMCO Global Service Inc. in Taiwan Held 30th Anniversary party at Kyoto Hotel Okura Released Deep RIE system, the RIE-400iPB for MEMS |
| 2010 |
July August September |
Released Plasma Enhanced CVD system, PD-330STC, designed for TSV mass production.
Released Plasma Enhanced CVD system, PD-5400, designed for LED mass production.
Opened East Coast Office in North Carolina, US. Opened Beijing office |
| 2011 | December | Released ICP etching system, RIE-331iPC, designed for Asia markets. |
| 2012 | May | Opened Vietnam Service Office in Ho Chi Minh city. |
