Plasma-Enhanced CVD System
SAMCO's Model PD-200D is an automated, ion-assisted CVD (chemical vapor deposition) processing system specifically designed for the rapid deposition of DLC (diamond-like carbon) on a variety of substrate materials and shapes. This system can also be used to anisotropically etch DLC films and silicon-based films at high rates.
The Model PD-200D is part of SAMCO's full line of automated CVD systems for both large-scale manufacturing and pilot production lines.

Applications

• Hard, low-friction wear coatings on magnetic recording heads
• Durable wear coatings on three dimensional metal bearings or reciprocating parts
• Microscopically smooth, chemically resistant, protective/release films on injection molds
• Electrically insulating or conductive wear coatings for sensors and micromachines
• Infrared-transparent, abrasion-resistant optical coatings on windows or sensors
• Anisotropic etching of patterned DLC or silicon-based films

Features

• Can process up to 8" wafers
• High DLC deposition rates of 300-500 nm/min.
• Produces high-quality, pin-hole free, low stress and uniform DLC films of up to 30 microns thick
• Deposits films with wide range of properties (i.e. mechanical, electrical, and optical), which may be tailored to specific applications
• Computer system/operator interface facilitates easy setup, recipe storage and selection of multi-step deposition and etching recipes
• Automated system with full manual override

Dimensions:

Main Unit: 1250(W) x 770(D) x 1680(H) mm

Control Unit: 570(W) x 630(D) x 1750(H) mm