PD-3800L

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Plasma-Enhanced CVD System
SAMCO's PD-3800L is a load-lock Plasma-Enhanced CVD system designed for the deposition of silicon-based thin films with high throughput. The system is ideal for the deposition of high-quality silicon oxide, silicon nitride and amorphous silicon films.
The SAMCO PD-3800L is a load-lock version of the Model PD-3800 with a sample stage effective area of 350mm in diameter.

Load-lock type system
Fully automatic operation
High throughput
Large samples stage (350mm in diameter)

Deposition of silicon oxide (SiO_x)
Deposition of silicon nitride (SiN)
Deposition of ceramic thin films
Deposition of amorphous silicon (α-Si:H)