Plasma-Enhanced CVD System
SAMCO's PD-4800 is a Plasma-Enhanced CVD system for mass production. Silicon oxide, silicon nitride and amorphous silicon films with excellent quality can be deposited with this system.

Applications

• Deposition of SiO2 films
• Deposition of SiN films
• Deposition of amorphous silicon (a-Si:H)

Features

• Sample size up to 210 x 295mm
• Excellent thickness uniformity
• Fully automatic operation
• Complete set of safety interlocks
• Compact design

Dimensions:

Main Unit: 1600(W) x 1100(D) x 1800(H) mm

Options:

• - Additional gas lines
• - Turbo molecular pump
• - Gas treatment unit