Liquid Source CVD System

The SAMCO PD-270STP is a unique Plasma-Enhanced CVD system utilizing a liquid TEOS source to deposit SiO₂ films at high speed using a low temperature process.
The strong sheath electrical field surrounding the cathode-coupled sample stage generates a high level of ion energy, which enables the deposition of silicon oxide films with low internal stress, from thin films to thick films (~30 μm).
A load-locked version (PD-270STL) of this system is also available.

Applications

• High-speed deposition of thick silicon oxide films (up to 30 μm)
• Fabrication of optical waveguides
• Fabrication of etch masks for micromachining
• Deposition of films on plastic surfaces
• Low temperature deposition (from ambient to 300°C)

Features

• High deposition rates (3000-5000 Å/min.)
• Enables deposition on larges steps (200 μm) with high aspect ratios
• SAMCO's liquid source TEOS deposition technology results in superior step-coverage and gap-fill performance
• Low Particle Levels - A unique reaction chamber design minimizes the generation of particles within the reaction chamber
• Control of Refractive Index - Germanium (Ge), Phosphorus, and Boron liquid source materials can be used to achieve control over the refractive index.
• Fully automatic "one-button" operation time with full manual override

Dimensions:

Main Unit: 1370(W) x 1800(D) x 2000(H) mm

Liquid Source Unit: 1370(W) x 563(D) x 2000(H) mm

Pump Unit: 761(W) x 708(D) x 946(H) mm