SAMCO Liquid Source PECVD System, Model PD-10ST, Thick Oxide and Nitride Deposition, Low Temperature Deposition

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Liquid Source CVD System

Model PD-10ST (LS-CVD)

The SAMCO PD-10ST is a liquid source CVD system that can deposit Silicon Oxide (SiO2) films at low temperature and very high rates. Low stress, 30 micron silicon oxide films can be grown without cracks or voids.

The SAMCO PD-10ST is ideally suited for deposition of thick silicon oxide films that are used for production of optoelectronic devices, micromachines, protective coatings and other applications. In addition, this system is also capable of depositing SiN films from gas sources.

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Dimensions:

Main Unit: 1350(W) x 1000(D) x 1607(H) mm

Options:

- Additional gas lines

- Gas treatment unit

Applications

Fabrication of optical waveguides and other optoelectronic devices
Deposition of passivation and dielectric layers for ICs
Manufacturing micro-electro-mechanical devices (MEMS), such as actuators, sensors and motors
Deposition of protective coatings for printer and disk heads
Deposition of thick SiN and SiO₂films

Features

High deposition rates (2000-5000 A/min.)
Low stress, high quality SiO2 films can be grown without cracks or voids between ambient temperature and 350C
A unique chamber design prevents particle generation
The TEOS liquid source is safe and provides superior step coverage