SAMCO CVD System, Model PD-200D for DLC Deposition, Plasma-Enhanced Chemical Vapor Deposition systems, CVD, Nitride Deposition, Oxide Deposition, DLC Deposition

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Plasma-Enhanced CVD System

Model PD-200D (DLC Deposition)

SAMCO's Model PD-200D is an automated, ion-assisted CVD (chemical vapor deposition) processing system specifically designed for the rapid deposition of DLC (diamond-like carbon) on a variety of substrate materials and shapes. This system can also be used to anisotropically etch DLC films and silicon-based films at high rates.

The Model PD-200D is part of SAMCO's full line of automated CVD systems for both large-scale manufacturing and pilot production lines.

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Dimensions:

Main Unit: 1250(W) x 770(D) x 1680(H) mm

Control Unit: 570(W) x 630(D) x 1750(H) mm

Applications

Hard, low-friction wear coatings on magnetic recording heads
Durable wear coatings on three dimensional metal bearings or reciprocating parts
Microscopically smooth, chemically resistant, protective/release films on injection molds
Electrically insulating or conductive wear coatings for sensors and micromachines
Infrared-transparent, abrasion-resistant optical coatings on windows or sensors
Anisotropic etching of patterned DLC or silicon-based films

Features

Can process up to 8" wafers
High DLC deposition rates of 300-500 nm/min.
Produces high-quality, pin-hole free, low stress and uniform DLC films of up to 30 microns thick
Deposits films with wide range of properties (i.e. mechanical, electrical, and optical), which may be tailored to specific applications
Computer system/operator interface facilitates easy setup, recipe storage and selection of multi-step deposition and etching recipes
Automated system with full manual override