Cluster type PECVD System Model PD-2203L (Modular, 1-3 chambers)

The SAMCO PD-2203L is a modular plasma-enhanced CVD system for pilot production applications. The system can be configured with up to 3 reaction chambers, which are installed around a centrally located load-lock chamber.

The PD-2203L is a cluster type CVD system, where each chamber can be used for a different plasma process. Samples are carried to a different chamber under vacuum through the load-lock chamber, where different processes can be carried out simultaneously, without exposing them to atmosphere.

The PD-2203L is ideal for sequential process using different process parameters and materials.

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Applications

• Pilot production of LCDs
• Passivation layer for organic EL (Electro Luminescence) devices
• Deposition of amorphous silicon (a-Si:H) for solar cells
• Deposition of silicon oxide (SiO₂) films
  
• Deposition of silicon nitride (Si₃N₄) films