SAMCO Liquid Source PECVD System, Model PD-270STP, Thick Oxide and Nitride Deposition, Low Temperature Deposition

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Liquid Source CVD System

Model PD-270STP (LS-CVD)

The SAMCO PD-270STP is a unique Plasma-Enhanced CVD system utilizing a liquid TEOS source to deposit SiO₂ films at high speed using a low temperature process.

The strong sheath electrical field surrounding the cathode-coupled sample stage generates a high level of ion energy, which enables the deposition of silicon oxide films with low internal stress, from thin films to thick films (~30 Microns).

A load-locked version (PD-270STL) of this system is also available.

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Dimensions:

Main Unit: 1370(W) x 1800(D) x 2000(H) mm

Liquid Source Unit: 1370(W) x 563(D) x 2000(H) mm

Pump Unit: 761(W) x 708(D) x 946(H) mm

Applications

High-speed deposition of thick silicon oxide films (up to 30 Microns)
Fabrication of optical waveguides
Fabrication of etch masks for micromachining
Deposition of films on plastic surfaces
Low temperature deposition (from ambient to 300 C)

Features

High deposition rates (3000-5000 A/min.)
Enables deposition on larges steps (200 Microns) with high aspect ratios
SAMCO's liquid source TEOS deposition technology results in superior step-coverage and gap-fill performance
Low Particle Levels - A unique reaction chamber design minimizes the generation of particles within the reaction chamber
Control of Refractive Index - Germanium (Ge), Phosphorus, and Boron liquid source materials can be used to achieve control over the refractive index.
Fully automatic "one-button" operation time with full manual override