SAMCO Plasma Enhanced CVD System, Model PD-3800, Batch Type Plasma-Enhanced Chemical Vapor Deposition systems, CVD, Nitride Deposition, Oxide Deposition, DLC Deposition

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Plasma-Enhanced CVD System

Model PD-3800 (batch-type)

SAMCO's PD-3800 is a Plasma-Enhanced CVD system designed for the deposition of silicon-based thin films on a pilot production basis. The system is ideal for the deposition of high-quality silicon oxide, silicon nitride and amorphous silicon films.

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Dimensions:

Main Unit: 790(W) x 1256(D) x 1323(H) mm

Control Unit: 570(W) x 630(D) x 1550(H) mm

Applications

Deposition of silicon oxide (SiO_x)
Deposition of silicon nitride (SiN)
Deposition of ceramic thin films
Deposition of amorphous silicon (a-Si:H)

Features

A unique showerhead gas manifold design ensures superior film uniformity
Gas inlet and outlet mechanism are designed to minimize generation of particles inside the reaction chamber
Fully automatic operation using a programmable controller
Complete set of safety interlocks
Compact footprint