Plasma-Enhanced CVD System Model PD-3800L (load-lock)

SAMCO's PD-3800L is a load-lock Plasma-Enhanced CVD system designed for the deposition of silicon-based thin films with high throughput. The system is ideal for the deposition of high-quality silicon oxide, silicon nitride and amorphous silicon films.

The SAMCO PD-3800L is a load-lock version of the Model PD-3800 with a sample stage effective area of 350mm in diameter. 

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Applications

• Deposition of silicon oxide (SiO_x)
  
• Deposition of silicon nitride (SiN)
• Deposition of ceramic thin films
• Deposition of amorphous silicon (a-Si:H)