Plasma-Enhanced CVD System Model PD-3802L (load-lock)

SAMCO's PD-3802L is a load-lock Plasma-Enhanced CVD system designed for the deposition of silicon-based thin films with high throughput. The system is ideal for the deposition of high-quality silicon oxide, silicon nitride and amorphous silicon films.

The SAMCO PD-3802L has a dual reaction chamber which enables the sequential deposition of 2 different types of films in dedicated process chambers. Each sample stage has an effective area of 350mm in diameter.

This system is also equipped with a Glove box. Isolation from atmospheric contaminants ensures a stable and repeatable deposition process.

Request more information

Applications

• Deposition of silicon oxide (SiO_x)
  
• Deposition of silicon nitride (SiN)
• Deposition of ceramic thin films
• Deposition of amorphous silicon (a-Si:H)