SAMCO Plasma Enhanced CVD System, Model PD-4800, Batch Type Plasma-Enhanced Chemical Vapor Deposition systems, CVD, Nitride Deposition, Oxide Deposition, DLC Deposition

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Plasma-Enhanced CVD System

Model PD-4800 (batch-type)

SAMCO's PD-4800 is a Plasma-Enhanced CVD system for mass production. Silicon oxide, silicon nitride and amorphous silicon films with excellent quality can be deposited with this system.

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Dimensions:

Main Unit: 1600(W) x 1100(D) x 1800(H) mm

Options:

- Additional gas lines
- Turbo molecular pump
- Gas treatment unit

Applications

Deposition of SiO2 films
Deposition of SiN films
Deposition of amorphous silicon (a-Si:H)

Features

Sample size up to 210x295mm
Excellent thickness uniformity
Fully automatic operation
Complete set of safety interlocks
Compact design