Reactive Ion Etching System Model RIE-100C (Cassette-to-Cassette)

SAMCO's RIE-100C is a low-cost, high-performance, fully automatic, dry etching system that meets the most demanding process requirements using fluorine chemistry. A computerized touch panel provides user-friendly interface for parameter control and recipe storage.

The RIE-100C is a cassette-to-cassette system designed for high-volume manufacturing, based on the field-proven RIE-10NR. This system is designed to process wafers up to 4".

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Applications

• Stripping of passivation materials including silicon nitride, silicon dioxide and silicon oxynitride
  
• Anisotropic etching of all types of silicon-based films, compound semiconductors and refractory metals including Si, SiO2, Poly-Si, SiN, GaAs and Mo
• Manufacturing of micromachines