Inductively Coupled Plasma Etching System Model RIE-140iP

SAMCO's RIE-140iP is a single wafer ICP etching system especially designed for compound semiconductor materials. This system features SAMCO's latest ICP plasma source technology which generates stable high-density plasma under low pressures and ensures precise anisotropic etching of GaN, InGaAs and quaternary compound semiconductor materials.

A cassette-to-cassette version of this system is also available which is equipped with a vacuum cassette chamber for high volume manufacturing. This is Model RIE-140iPC.

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Applications

• Fabrication of laser diodes
• Photonic crystal devices
• Quantum dot devices