Batch Type Reactive Ion Etching System, Large Chamber RIE System, Model RIE-6000

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Reactive Ion Etching System

Model RIE-6000

SAMCO's RIE-6000 is a large batch type reactive ion etching system used to etch all types of semiconducting, insulating and metallic films.

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Dimensions:

Main Unit: 1100(W) x 1720(D) x 2000(H) mm
Controller: 570(W) x 630(D) x 1843(H) mm
Pump unit: 400(W) x 760(D) x 906(H) mm
Chiller: 570(W) x 677(D) x 1236(H) mm

600mm x 600mm sample stage

Applications

Superior anisotropic etching performance for silicon films used in ULSI devices
Etching of refractory metal films
Fabrication of light waveguides
Fabrication of micromachines
Manufacturing of various types of sensors
Processing of wafer level chip scale packages

Features

Large sample stage (600x600mm)
Easy to use computerized touch panel enables fully automatic operation of the system, as well as management of process parameters
Max. 5KW RF generator (water cooled)
Up to 4 mass flow controllers (MFC)
Equipped with compound turbo and backing dry pumps
Recipe storage and data logging