Bench top UV-Ozone Cleaning System Model UV-2

SAMCO's UV-2 is a compact, high-performance, bench top, UV-Ozone Cleaning system. The UV-2 is modular in design and can be configured specifically, upon order, for a number of cleaning, stripping or UV-curing applications. This system is drawer loaded and uses patented technology to uniformly distribute ozone and UV light over the surface of wafers or other substrates. The system employs a programmable logic controller and safety interlocks to protect the operator from hazardous exposure to process ozone and UV light.

This easy to operate system uses a unique combination of ultraviolet radiation, ozone and heat to gently, yet effectively, remove organic materials from a variety of substrates including silicon, gallium arsenide (GaAs), Sapphire, metals, ceramics, quartz and glass.

The versatile UV-2 is well-suited for a variety of applications such as substrate cleaning, photoresist descumming, improving wettability, and UV curing. By operating at atmospheric pressure, the SAMCO UV-2 eliminates the need for a cumbersome, high-maintenance vacuum system. This system is CE marked and UL certified.

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Applications

• Removing organic contamination
  
• Pre-clean wafers prior to deposition (e.g. GaAs prior to MBE, sapphire prior to HgCdTe)
• Descumming photoresist and polyimide
• Modifying surfaces for better adhesion
• Final cleaning before wafer bonding
• UV curing
• Growth of thin stable oxide films (Ge, Si)
• Cleaning of AFM tips