SAMCO UV Ozone Cleaning System UV-Ozone Stripper/Cleaner, Model UV-300H

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UV-Ozone Cleaning System

Model UV-300H

SAMCO's UV-300H utilizes a combination of ultraviolet light, a high concentration of ozone and controlled heating to provide effective cleaning and stripping without causing electrical damage to circuits. Substrates are loaded into the system through a sliding drawer.

Applications include removing ink dots following test, photoresisit and polyimide ashing and cleaning of organic contamination.

This high-performance unit provides photoresist ashing rates of up to 5000 A/min. and includes numerous safety features to protect the operator and the system. The UV-300H operates at atmospheric pressure, and does not require a cumbersome, high maintenance vacuum system.

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Dimensions:

Main Unit: 698(W) x 800(D) x 1306(H) mm

Applications

Stripping of photoresist and polyimide
Removing ink from EPROM wafers without erasing programs
Removing organic contamination from substrates prior to thin film deposition
Surface preparation for lube or photoresist
Descumming photoresist and E-beam resist
Cleaning prior to wafer bonding

Features

Utilizes a unique combination of ultraviolet light, high-concentration ozone and controlled heating for efficient cleaning
"Soft" completely dry process will not cause electrical damage to circuits
Easy, drawer type loading of substrates
Compact, uses minimum clean room space
Temperature control (Ambient to 300 C)
Operates at atmospheric pressure - no vacuum system required
Safety features include: drawer interlock, automatic purge cycle, air pressure interlock, cooling water interlock, ozone scrubber and emergency off switch