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UV-Ozone Cleaning System

Model UV-300HC

SAMCO's UV-300HC is a completely dry UV Ozone Cleaning process equipped with cassette to cassette mechanism to strip photoresist and to remove all types of organic contaminant using both UV light radiation and high concentration ozone. This system includes two cassettes and can have a max. of 12 trays/cassette.

 

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Dimensions:

Main Unit: 1100(W) x 1740(D) x 1625(H) mm

 

Applications

  • Stripping of photoresist and polyimide
  • Removing ink from EPROM wafers without erasing programs
  • Removing organic contamination from substrates prior to thin film deposition
  • Surface preparation for lube or photoresist
  • Descumming photoresist and E-beam resist
  • Cleaning prior to wafer bonding

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Features

  • Utilizes a unique combination of ultraviolet light, high-concentration ozone and controlled heating for efficient cleaning
  • Cassette-to-cassette operation
  • Max. two cassettes with 12 trays/cassette
  • Equipped with single arm type robot
  • 205mm quartz trays with nine 2" recess
  • System is also equipped with a cooling stage
  • Two high-concentration ozone generators
  • Temperature control (Ambient to 300 C)
  • Operates at atmospheric pressure - no vacuum system required
  • Touch panel operation