SAMCO's UV-Ozone Cleaning systems use a
combination of ultraviolet irradiation and ozone to remove organic
materials from a variety of substrates, improve wettability, and
enhance adhesion. It is a very gentle yet effective process
designed to meet your photoresist stripping and surface cleaning
needs.
Process Description: Ozone, in the presence of long
wavelengths (200-300nm) UV radiation, decomposes into oxygen
molecules and atomic oxygen. Simultaneously, organic materials
such as photoresist, ink, human skin oil, pump oil, etc. are
excited or dissociated by the long wavelength UV radiation. The
atomic oxygen is highly reactive and oxidizes the excited organic
molecules to form simpler, harmless volatile products, such as
carbon dioxide, water, nitrogen, etc. Organic contaminants are
cleaned and removed from the substrate surface using SAMCO's
UV-Ozone Cleaning systems.