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SAMCO's UV-Ozone Cleaning systems use a combination of ultraviolet irradiation and ozone to remove organic materials from a variety of substrates, improve wettability, and enhance adhesion. It is a very gentle yet effective process designed to meet your photoresist stripping and surface cleaning needs.

Process Description: Ozone, in the presence of long wavelengths (200-300nm) UV radiation, decomposes into oxygen molecules and atomic oxygen. Simultaneously, organic materials such as photoresist, ink, human skin oil, pump oil, etc. are excited or dissociated by the long wavelength UV radiation. The atomic oxygen is highly reactive and oxidizes the excited organic molecules to form simpler, harmless volatile products, such as carbon dioxide, water, nitrogen, etc. Organic contaminants are cleaned and removed from the substrate surface using SAMCO's UV-Ozone Cleaning systems.

UV-1

- Compact bench-top system

- Heated sample stage

- Process up to 6" wafers

- Low cost

UV-2

- Compact bench-top system

- Drawer loaded

- Process up to 8" wafers

- Heated sample stage

UV-300

- Compact bench-top system

- Process up to 12" wafers

- Rotating and heated stage

- Two ozone generators

 

UV-300H

- Process up to 300mm wafers

- Heated sample stage

- High-concentration ozone generators

- Drawer loaded

UV-300HC

- Cassette-to-cassette operation

- Temperature control (Ambient to 300C)

- High-concentration ozone generators

- Separate cooling stage

- Two cassettes with 12 trays/cassette