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Plasma CVD
Dry Etching
Cleaning

High-speed Etching of SiO₂ and SiC

Plasma Cleaning of LED Lighting Package

Deep Etching of Compound Semiconductors

SiC Power Device Projects at SAMCO

Properties of SiN films deposited with the SAMCO PD-220LC system. Repeatability data of SiN deposition.

Square Hole Etching of Silicon

GaN MOSFET with SiO2 Gate Oxide Deposited by Silane-Based PECVD

Deposition and characterization of silicon carbon nitride films prepared by RF-PECVD with capacitive coupling

Properties of SiCN films prepared by Cathode Coupled P-CVD Using Liquid Source Material

Properties of SiN films deposited with the SAMCO PD-220LC system. Repeatability data of SiN deposition.

GaN MOSFET with SiO2 Gate Oxide Deposited by Silane-Based PECVD

Deposition and characterization of silicon carbon nitride films prepared by RF-PECVD with capacitive coupling

Properties of SiCN films prepared by Cathode Coupled P-CVD Using Liquid Source Material

High-speed Etching of SiO₂ and SiC

Deep Etching of Compound Semiconductors

SiC Power Device Projects at SAMCO

Square Hole Etching of Silicon

Plasma Cleaning of LED Lighting Package

SAMCO Interviews Interview with SAMCO users