Category: Samco Customer Publication

02 Aug

Scientific paper on Si subwavelength grating from Tohoku University, Japan

Samco 2023 Customer, Samco Customer Publication, Silicon/Dielectrics PECVD, SiO2 PECVD

Micro-fabricated Si subwavelength grating for frequency-domain THz beam steering covering the 0.3–0.5 THz frequency band

Kohei Chiba, Taiyu Okatani, Naoki Inomata, and Yoshiaki Kanamori

Graduate School of Engineering, Department of Robotics, Tohoku University, 6-6-01 Aoba, Aramaki,
Aoba-ku, Sendai, Miyagi, Japan

Opt. Express 31, 27147-27160 (2023)

Samco PECVD system PD-100ST was used for SiO2 film deposition using TEOS.

20 Jun

Scientific paper on polycrystalline Si film from Colorado School of Mines

Samco Samco Customer Publication, Si Etch, Silicon/Dielectrics Etch, Solar Cell

Pinhole electrical conductivity in polycrystalline Si on locally etched SiNy/SiOx passivating contacts for Si solar cells

C.L. Anderson a b, H.L. Guthrey b, W. Nemeth b, C.-S. Jiang b, M.R. Page b, P. Stradins a b, S. Agarwal a b

a
Department of Chemical and Biological Engineering, Colorado School of Mines, Golden, CO, 80401, USA
b
National Renewable Energy Laboratory, Golden, CO, 80401, USA

Materials Science in Semiconductor Processing, Volume 165, 2023, 107655,
ISSN 1369-8001,
https://doi.org/10.1016/j.mssp.2023.107655.

Boron-doped polycrystalline Si on locally etched silicon nitride/silicon oxide (PLENO) passivating contacts was studied for monocrystalline Si (c-Si) solar cell application. Samco open-load RIE system RIE-10NR was used for silicon etching.

31 May

Scientific paper on energy-conversion device from Politecnico di Torino

Samco 2022 Customer, Plasma Treatment, Samco Customer Publication, Surface Treatment

Textured and Rigid Capillary Materials for Passive Energy-Conversion Devices

Alberghini, M., Morciano, M., Giardino, M., Perrucci, F., Scaltrito, L., Janner, D., Chiavazzo, E., Fasano, M., Asinari, P., Textured and Rigid Capillary Materials for Passive Energy-Conversion Devices. Adv. Mater. Interfaces 2022, 2200057. https://doi.org/10.1002/admi.202200057

Samco RIE system RIE-10NR was used for oxygen plasma treatment for surface functionalization in fabrication of passive energy-conversion devices.

15 May

Scientific paper on GaP grating fabrication from University of Ottawa

Samco 2022 Customer, Compound Semiconductor Etching, GaP Etch, Samco Customer Publication, Silicon/Dielectrics Etch, SiO2 Etch

Scalable Fabrication of Nanogratings on GaP for Efficient Diffraction of Near-Infrared Pulses and Enhanced Terahertz Generation by Optical Rectification

Mohammad Bashirpour1, Wei Cui1, Angela Gamouras1,2 and Jean-Michel Ménard1,2
1 Department of Physics, University of Ottawa, Ottawa, ON K1N 7N9, Canada
2 National Research Council Canada, Ottawa, ON K1A 0R6, Canada
Crystals 2022, 12, 684. https://doi.org/10.3390/cryst12050684

Samco RIE system RIE-10NR was used for SiO2 hardmask patterning using photoresist mask. Then, Samco ICP-RIE system was used for GaP etching using the SiO2 hardmask for wafer-scale fabrication of a surface phase grating with submicron feature sizes.

14 Mar

Scientific paper on PDMS microfluidic device fabrication from the University of Tokyo

Samco 2022 Customer, Plasma Treatment, Samco Customer Publication, Surface Treatment

Functional analysis of human brain endothelium using a microfluidic device integrating a cell culture insert

Shigenori Miura1, Yuya Morimoto2, Tomomi Furihata3 and Takeuchi1,2,4
1 Institute of Industrial Science, The University of Tokyo, Tokyo, Japan
2 Department of Mechano-Informatics, Graduate School of Information Science and Technology, The University of Tokyo, Tokyo, Japan
3 Laboratory of Clinical Pharmacy and Experimental Therapeutics, School of Pharmacy, Tokyo University of Pharmacy and Life Sciences, Tokyo, Japan
4 International Research Center for Neurointelligence (WPI-IRCN), The University of Tokyo Institutes for Advanced Study (UTIAS), The University of Tokyo, Tokyo, Japan
APL Bioengineering 6, 016103 (2022); https://doi.org/10.1063/5.0085564

Aqua Plasma Treatment was used for PDMS/PDMS bonding microfluidic device fabrication. Samco Aqua Plasma technology for polymer surface activation and bonding without adhesives can be found in the following webpage.

Plasma Treatment & Bonding for Polymer Microfluidics

10 Mar

Scientific paper on metal-oxide transistors from Chung-Ang University

Samco 2022 Customer, Samco Customer Publication, Surface Treatment

Symmetrically Ion-Gated In-Plane Metal-Oxide Transistors
for Highly Sensitive and Low-Voltage Driven Bioelectronics

Jingu Kanga), Young-Woo Janga), Sang Hee Moona), Youngjin Kangb), Jaehyun Kimc), Yong-Hoon Kimb), Sung Kyu Parka)
a) School of Electrical and Electronics Engineering, Chung-Ang University, Seoul 06974, Korea
b) School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Korea
c) Department of Chemistry and Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208, USA
Adv. Sci. 2022, 2103275. https://doi.org/10.1002/advs.202103275

Samco UV-Ozone cleaner UV-1 was used for surface treatment of aluminum to form a monolithic Al2O3 layer in fabrication of metal-oxide transistors with amorphous indium-gallium-zinc oxide (a-IGZO).

28 Feb

Scientific paper on organic FET fabrication from Carleton University

Samco 2022 Customer, Microfluidics, PMMA, Samco Customer Publication, Surface Treatment, UV-Ozone

A Low Temperature Processed, Soft-fluidic OEGFET Saliva Aptasensor for Cortisol

Roslyn S. Massey and Ravi Prakash
Department of Electronics Engineering, Carleton University, Ottawa, ON K1S 5B6, Canada;
IEEE Journal on Flexible Electronics, 1 – 1, 2022

Samco UV-Ozone cleaner UV-1 was used for PMMA surface treatment in biosensor fabrication.

12 Apr

Scientific Paper on boron-doped diamond electrode from Chinese Academy of Sciences

Samco 2021 Customer, Diamond Etch, Other Materials Etch, Samco Customer Publication

Effect of oxygen terminated surface of boron-doped diamond thin-film electrode on seawater salinity sensing

Dan Shi a,b, Lusheng Liu a, Zhaofeng Zhai a, Bin Chen a,b, Zhigang Lu a,b, Chuyan Zhang a,c, Ziyao Yuan a,b, Meiqi Zhou a,b, Bing Yang a , Nan Huang a and Xin Jiang a,c
a Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, 110016, China
b School of Materials Science and Engineering, University of Science and Technology of China, Shenyang, 110016, China
c Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Str. 9-11, Siegen, 57076, Germany
Journal of Materials Science & Technology, Volume 86, Pages 1-10 (2021)

Boron-doped diamond is an interesting material for sensing application. Samco open-load RIE system RIE-10NR was used for patterning and surface treatment in oxygen plasma.

11 Apr

Scientific Paper on TiN on Si hybrid-plasmonic-photonic waveguide from Virginia Commonwealth University

Samco 2021 Customer, Other Materials Etch, Samco Customer Publication, Si Etch, Silicon/Dielectrics Etch, TiN Etch

A Platform for CMOS Compatible Plasmonics: High Plasmonic Quality Titanium Nitride Thin Films on Si (001) with an MgO Interlayer

Kai Ding 1, Dhruv Fomra 1, Alexander V. Kvit 2, Hadis Morkoç 1, Nathaniel Kinsey 1, Ümit Özgür 1 and Vitaliy Avrutin 1
1 Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond, Virginia, 23284 USA
2 Materials Science Center, University of Wisconsin‐Madison, Madison, WI, 53706 USA
Advanced Photonics Research, 2000210 (2021)

A CMOS compatible hybrid-plasmonic-photonic waveguide was fabricated using TiN layer deposited by PEALD on Si (001) substrate with MgO interlayer. Samco ICP-RIE system RIE-101iPH was used for TiN/Au etching in chlorine chemistry and also Si etching in fluorine chemistry.

For more details of our ICP-RIE etch systems, please visit the product page below.
ICP-RIE Etch Systems

27 Mar

Scientific paper on 200 nm-period grating Si deep etching (6 µm) by MIT Kavli Institute

Samco 2019 Customer, Samco Customer Publication

Progress in x-ray critical-angle transmission grating technology development

Ralf K. Heilmann,1 Alexander R. Bruccoleri,2 Jungki Song,1 Mark L. Schattenburg1
1MIT Kavli Institute for Astrophysics and Space Research (United States)
2Izentis LLC (United States)
Proc. SPIE 11119, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX, 1111913 (9 September 2019); https://doi.org/10.1117/12.2529354

Samco Si DRIE Equipment was used for 200 nm-period grating Si deep etching (6 µm).