Scientific Paper on N-doped a-SiC Film Deposition Using PECVD from Yamaguchi University, Japan
Fabrication of silicon and carbon based wide-gap semiconductor thin films for high conversion efficiency
Kohsuke Yoshinaga, Hiroshi Naragino, Akira Nakahara and Kensuke Honda
Graduate school of Science and Engineering, Yamaguchi University, 1677-1, Yoshida,
Yamaguchi-shi, Yamaguchi, 753-8512, Japan
Journal of Physics: Conference Series (2013) 441, conference 1
SAMCO PECVD System was used for deposition of Nitrogen-doped amorphous silicon carbide films (N-doped a-SiC) to investigate the film properties.