Category: Microfluidics

22 Feb

Scientific Paper on Microfluidic Chip Fabrication Using Silicon Deep RIE from Vietnam National University

SAMCO 2017 Customer, Microfluidics, SAMCO Customer Publication, Si DRIE, Silicon/Dielectrics Etch

Fabrication of 25 μm-filter microfluidic chip on silicon substrate

Nguyen Ngan Le1,2, Kim Khanh Huynh1, Thi Cam Hue Phan1, Thi My Dung Dang1 and Mau Chien Dang1
1 Laboratory for Nanotechnology, Vietnam National University in Ho Chi Minh City, Community 6, Linh
Trung Ward, Thu Duc District, Ho Chi Minh, Vietnam
2 University of Science, Vietnam National University in Ho Chi Minh City, 227 Nguyen Van Cu Street,
District 5, Ho Chi Minh City, Vietnam
Adv. Nat. Sci.: Nanosci. Nanotechnol. 8 (2017) 015003

A microfluidic chip device was fabricated using deep silicon etching technology of the Bosch Process. Samco Deep RIE Tool RIE-200iPB was used for silicon etching over silver hard mask. With optimization of process recipe in the silicon etching, vertical silicon channel profile was fabricated.

Si DRIE

For more details of our deep RIE process capabilities, please visit the pages below.
Silicon DRIE (Deep Reactive Ion Etching) for MEMS and TSV
Deep Silicon Trench/Via Hole/Pillar Etching using the Bosch Process

06 Sep

Scientific Paper on Wettability Control in Porous Media Using UV-Ozone Treatment by MIT

SAMCO 2016 Customer, Microfluidics, SAMCO Customer Publication, Surface Treatment, UV-Ozone

Wettability control on multiphase flow in patterned microfluidics

Benzhong Zhaoa, Christopher W. MacMinnb, and Ruben Juanesa
a Department of Civil and Environmental Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139;
b Department of Engineering Science, University of Oxford, Oxford OX1 3PJ, United Kingdom
PNAS (2016) DOI10.1073/pnas.1603387113

Fluid–fluid displacement in porous media of microfluidic flow cell was studied for potential CO2 sequestration application to solve global warming caused by the greenhouse gas.
Samco tabletop UV-ozone cleaner at MIT was used for wettability improvement of photocurable polymer NOA81 to fabricate microfluidic flow cells.

This article was featured in MIT News.
View the news article.

15 Aug

Scientific Paper on Nanopore DNA Sequencing Technique Development

SAMCO 2016 Customer, Microfluidics, Plasma Treatment, SAMCO Customer Publication, Surface Treatment

Integrated solid-state nanopore platform for nanopore fabrication via dielectric breakdown, DNAspeed deceleration and noise reduction

Yusuke Goto, Itaru Yanagi, Kazuma Matsui, Takahide Yokoi & Ken-ichi Takeda
Center for Technology Innovation – Healthcare, Research & Development Group, Hitachi Ltd.,1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan.
Scientific Reports 6, Article number: 31324 (2016) doi:10.1038/srep31324

Samco plasma cleaner was used for surface cleaning and wettability modulation of substrates with Si3N4 membranes in sample preparation.

06 Aug

Scientific Paper on Fused Silica Nanofluidic Device Fabrication by National Taiwan University Team

SAMCO 2016 Customer, Microfluidics, Silicon/Dielectrics Etch, SiO2 Etch

Multiplexed immunosensing and kinetics monitoring in nanofluidic devices with highly enhanced target capture efficiency

Yii-Lih Lin1,2,3, Yen-Jun Huang3,4, Pattamon Teerapanich5,6, Thierry Leïchlé5,6 and Chia-Fu Chou2,3
1 Department of Chemistry, National Taiwan University, Taipei, Taiwan
2 Nano Science and Technology Program, Taiwan International Graduate Program, Academia Sinica and National Taiwan University, Taipei, Taiwan
3 Institute of Physics, Academia Sinica, Taipei, Taiwan
4 Department of Physics, National Taiwan University, Taipei, Taiwan
5 LAAS-CNRS, 7 Avenue du Colonel Roche, F-31077 Toulouse, France
6 Université de Toulouse, F-31077 Toulouse, France
Biomicrofluidics 10, 034114 (2016)

Samco ICP etch system, RIE-10iP was used for nano-slit pattern fabrication by fused quartz plasma etching.

For our process capabilities of SiO2 and quartz plasma etching, please visit the process data page below.
SiO2 Dry Etching Process (RIE or ICP-RIE)

31 Mar

Scientific Paper on Silicon Nanowire Fabrication for Biosensing Applications from Universiti Malaysia Perlis

SAMCO 2016 Customer, Microfluidics, SAMCO Customer Publication, Si Etch, Silicon/Dielectrics Etch

Top-Down Nanofabrication and Characterization of 20 nm Silicon Nanowires for Biosensing Applications

M. Nuzaihan M. N 1, U. Hashim1,2, M. K. Md Arshad1,2, A. Rahim Ruslinda1, S.F.A. Rahman3, M. F. M. Fathil1, Mohd. H. Ismail2
1 Institute of Nano Electronic Engineering, Universiti Malaysia Perlis, 01000 Kangar, Perlis, Malaysia,
2 School of Microelectronic Engineering, Universiti Malaysia Perlis (UniMAP), 02600 Pauh, Perlis, Malaysia,
3 Chemistry Department, Faculty of Science, Universiti Putra Malaysia, 43400 UPM Serdang, Selangor, Malaysia
PLoS ONE 11(3): e0152318. doi:10.1371/journal.pone.0152318

Samco ICP etch system at Universiti Malaysia Perlis was used for anisotropic etching of silicon for silicon nanowires fabrication.
For our process examples of silicon dry etching, please visit the process data page below.
Si Dry Etching Process (RIE, ICP-RIE or XeF2 Etch)

13 Feb

Scientific Paper on Microfluidic Chip Fabrication from AIST

SAMCO 2016 Customer, Microfluidics, SAMCO Customer Publication, Si Etch, Silicon/Dielectrics Etch

Microfluidic chips for forward blood typing performed with a multichannel waveguide-mode sensor

Hiroki Ashibaa, Makoto Fujimakia, Koichi Awazuv, Torahiko Tanakab and Makoto Makishimab
a Electronics and Photonic Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
b Division of Biochemistry, Department of Biomedical Sciences, Nihon University School of Medicine, 30-1 Oyaguchi-kamicho, Itabashi, Tokyo 173-8610, Japan
Sensing and Bio-Sensing Research 2016 Volume 7, March 2016, Pages 121-126

Samco ICP etcher was used to fabricate a mold template of microfluidic chips by silicon plasma etching.

For our process capabilities of silicon plasma etching, please visit the process data page below.
Si Dry Etching Process (RIE, ICP-RIE or XeF2 Etch)

21 Jan

Scientific Paper on Microfluidic Device Fabrication from National Taiwan University

SAMCO 2016 Customer, Microfluidics, SAMCO Customer Publication, Si DRIE, Silicon/Dielectrics Etch

Enhancement of microfluidic particle separation using cross-flow filters with hydrodynamic focusing

Yun-Yen Chiu, Chen-Kang Huang, and Yen-Wen Lu
Department of Bio-Industrial Mechatronics Engineering, National Taiwan University, Taipei 10617, Taiwan, Republic of China
Biomicrofluidics (2016) 10, 011906

Samco silicon DRIE system at National Taiwan University was used for microchannel fabrication with crossflow filtration mechanism.

For more details of our deep silicon etching capabilities, please visit the process data pages below.
Deep Silicon Trench/Via Hole Etching using Bosch Process
Si DRIE (Deep Reactive Ion Etching) for MEMS and TSV

01 Oct

Scientific Paper on Microfluidics Fabrication from Princeton University Using SAMCO DRIE System

SAMCO 2015 Customer, Microfluidics, SAMCO Customer Publication, Si DRIE, Silicon/Dielectrics Etch

Microfluidic chemical processing with on-chip washing by deterministic lateral displacement arrays with separator walls

Yu Chen1,2, Joseph D’Silva1,2, Robert H. Austin1,3 and James C. Sturm1,2
1 Princeton Institute for Science and Technology of Materials (PRISM), Princeton, New Jersey 08544, USA
2 Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544, USA
3 Department of Physics, Princeton University, Princeton, New Jersey 08544, USA
BIOMICROFLUIDICS 9, 054105 (2015)

Samco Silicon DRIE System at Princeton University was used for microchannel fabrication. Silicon Periodic Table

For our process capabilities of deep silicon etching, please visit the pages below.
Si DRIE (Deep Reactive Ion Etching) for MEMS and TSV
Deep Silicon Trench/Via Hole Etching using Bosch Process

01 Jul

Scientific Paper on Microfluidics Fabrication from Nagoya University, Osaka University and AIST

SAMCO 2015 Customer, Microfluidics, SAMCO Customer Publication, Silicon/Dielectrics Etch, SiO2 Etch

Three-dimensional Nanowire Structures for Ultra-Fast Separation of DNA, Protein and RNA Molecules

Sakon Rahong1,2, Takao Yasui2,3, Takeshi Yanagida4, Kazuki Nagashima4, Masaki Kanai4,
Gang Meng4, Yong He4, Fuwei Zhuge4, Noritada Kaji2,3, Tomoji Kawai4 & Yoshinobu Baba1,2,3,5
Institute of Innovation for Future Society, Nagoya University, JAPAN.
FIRST Research Center for Innovative Nanobiodevices, Nagoya University, JAPAN.
Department of Applied Chemistry, Graduate School of Engineering, Nagoya University, JAPAN.
The Institute of Scientific and Industrial Research, Osaka University, JAPAN.
Health Research Institute, National Institute of Advanced Industrial Science and. Technology (AIST), JAPAN.
Scientific Reports 5, Article number: 10584 (2015) doi:10.1038/srep10584

SAMCO Reactive Ion Etching System RIE-10NR was used for SiO2 plasma etching over Cr mask. This process is used for micro-channel fabrication on microfluidic system which enables ultra-fast separation of biomolecules (DNA, Protein and RNA Molecules). SiO2 Periodic Table

For our process examples and capabilities of SiO2 plasma etching, please visit the process data page below.
SiO2 Dry Etching Process (RIE or ICP-RIE)

16 May

Scientific Paper on InP Microenclosure Array Fabrication Using InP Plasma Etching from Tokyo Institute of Technology

SAMCO 2015 Customer, Compound Semi Etch, InP Etch, Microfluidics, SAMCO Customer Publication

Single-Cell Isolation and Size Sieving Using Microenclosure Array for Microbial Analysis

Akihiro Matsutani* and Ayako Takada1
Semiconductor and MEMS Processing Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
1Biomaterial Analysis Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8501, Japan
Sensors and Materials, Volume 27, Number 5 (2015)

Samco open-load ICP etch system was used for fabrication of micropillar fabrication on InP substrates for cell isolation and size sieving.

InP Periodic Table
For more details of our InP plasma etching capabilities, please visit the page below.
InP Dry Etching Process (RIE or ICP-RIE)

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