Three-dimensional Nanowire Structures for Ultra-Fast Separation of DNA, Protein and RNA Molecules

Sakon Rahong^1,2, Takao Yasui^2,3, Takeshi Yanagida⁴, Kazuki Nagashima⁴, Masaki Kanai⁴,
Gang Meng⁴, Yong He⁴, Fuwei Zhuge⁴, Noritada Kaji^2,3, Tomoji Kawai⁴ & Yoshinobu Baba^1,2,3,5
1 Institute of Innovation for Future Society, Nagoya University, JAPAN.
² FIRST Research Center for Innovative Nanobiodevices, Nagoya University, JAPAN.
³ Department of Applied Chemistry, Graduate School of Engineering, Nagoya University, JAPAN.
⁴ The Institute of Scientific and Industrial Research, Osaka University, JAPAN.
⁵ Health Research Institute, National Institute of Advanced Industrial Science and. Technology (AIST), JAPAN.
Scientific Reports 5, Article number: 10584 (2015) doi:10.1038/srep10584

SAMCO Reactive Ion Etching System RIE-10NR was used for SiO₂ plasma etching over Cr mask. This process is used for micro-channel fabrication on microfluidic system which enables ultra-fast separation of biomolecules (DNA, Protein and RNA Molecules).

For our process examples and capabilities of SiO₂ plasma etching, please visit the process data page below.
SiO₂ Dry Etching Process (RIE or ICP-RIE)

Single-Cell Isolation and Size Sieving Using Microenclosure Array for Microbial Analysis

Akihiro Matsutani^* and Ayako Takada¹
Semiconductor and MEMS Processing Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
¹Biomaterial Analysis Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8501, Japan
Sensors and Materials, Volume 27, Number 5 (2015)

Samco open-load ICP etch system was used for fabrication of micropillar fabrication on InP substrates for cell isolation and size sieving.

For more details of our InP plasma etching capabilities, please visit the page below.
InP Dry Etching Process (RIE or ICP-RIE)

Area-Specific Cell Stimulation via Surface-Mediated Gene Transfer Using Apatite-Based Composite Layers

Yushin Yazaki ^1,2, Ayako Oyane ², Yu Sogo³, Atsuo Ito³, Atsushi Yamazaki¹ and Hideo Tsurushima ^2,4
1 Department of Resources and Environmental Engineering, Waseda University, 3-4-1 Okubo, Shinjuku, Tokyo 169-8555, Japan
² Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology, Central 4, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562, Japan
³ Health Research Institute, National Institute of Advanced Industrial Science and Technology, Central 6, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8566, Japan
⁴ Department of Neurosurgery, Faculty of Medicine, University of Tsukuba, 1-1-1 Tennoudai, Tsukuba, Ibaraki 305-8575, Japan
Int. J. Mol. Sci. 2015, 16(4), 8294-8309

Samco bench-top RIE etcher was used for plasma treatment of polystyrene substrates before coating with amorphous calcium phosphate (ACP).

DNA combing on low-pressure oxygen plasma modified polysilsesquioxane substrates for single-molecule studies

K. K. Sriram^1,2,3 Chun-Ling Chang³ U. Rajesh Kumar^1,4,5 and Chia-Fu Chou^3,6,7
1 Nano Science and Technology Program, Taiwan International Graduate Program, Academia Sinica, Taipei 11529, Taiwan
² Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan
³ Institute of Physics, Academia Sinica, Taipei 11529, Taiwan
⁴ Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 10617, Taiwan
⁵ Department of Chemistry, National Taiwan University, Taipei 10617, Taiwan
⁶ Genomics Research Center, Academia Sinica, Taipei 11529, Taiwan
⁷ Research Center for Applied Sciences, Academia Sinica, Taipei 11529, Taiwan
Biomicrofluidics (2014) 8, 052102

SAMCO ICP Etch System was used for microchannel fabrication on fused silica glass substrates.

For more details of our glass dry etch technologies (SiO2, fused silica and quartz), please visit the page below.
SiO₂ Dry Etching Process (RIE or ICP-RIE)

Heterogeneously integrated laser-induced fluorescence detection devices: Integration of an excitation source

Toshihiro Kamei, Keiko Sumitomo, Sachiko Ito, Ryo Takigawa, Noriyuki Tsujimura, Hisayuki Kato, Takeshi Kobayashi and Ryutaro Maeda
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
Japanese Journal of Applied Physics (2014) 53, 06JL02

P-doped, undoped and B-doped a-Si:H film deposition were performed using SAMCO PECVD System for microfluidic device fabrication.