Scientific Paper on InP Microenclosure Array Fabrication Using InP Plasma Etching from Tokyo Institute of Technology
Akihiro Matsutani* and Ayako Takada1
Semiconductor and MEMS Processing Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
1Biomaterial Analysis Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8501, Japan
Sensors and Materials, Volume 27, Number 5 (2015)
Samco open-load ICP etch system was used for fabrication of micropillar fabrication on InP substrates for cell isolation and size sieving.
For more details of our InP plasma etching capabilities, please visit the page below.
InP Dry Etching Process (RIE or ICP-RIE)
Scientific Paper on Gene Transfer System Fabrication Using Polystyrene Plasma Treatment by Waseda University Team
Area-Specific Cell Stimulation via Surface-Mediated Gene Transfer Using Apatite-Based Composite Layers
Yushin Yazaki 1,2, Ayako Oyane 2, Yu Sogo3, Atsuo Ito3, Atsushi Yamazaki1 and Hideo Tsurushima 2,4
1 Department of Resources and Environmental Engineering, Waseda University, 3-4-1 Okubo, Shinjuku, Tokyo 169-8555, Japan
2 Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology, Central 4, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562, Japan
3 Health Research Institute, National Institute of Advanced Industrial Science and Technology, Central 6, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8566, Japan
4 Department of Neurosurgery, Faculty of Medicine, University of Tsukuba, 1-1-1 Tennoudai, Tsukuba, Ibaraki 305-8575, Japan
Int. J. Mol. Sci. 2015, 16(4), 8294-8309
Samco bench-top RIE etcher was used for plasma treatment of polystyrene substrates before coating with amorphous calcium phosphate (ACP).
Scientific Paper on Microfluidics Fabrication Using Glass Dry Etching by National Tsing Hua University, Taiwan
DNA combing on low-pressure oxygen plasma modified polysilsesquioxane substrates for single-molecule studies
K. K. Sriram1,2,3 Chun-Ling Chang3 U. Rajesh Kumar1,4,5 and Chia-Fu Chou3,6,7
1 Nano Science and Technology Program, Taiwan International Graduate Program, Academia Sinica, Taipei 11529, Taiwan
2 Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan
3 Institute of Physics, Academia Sinica, Taipei 11529, Taiwan
4 Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 10617, Taiwan
5 Department of Chemistry, National Taiwan University, Taipei 10617, Taiwan
6 Genomics Research Center, Academia Sinica, Taipei 11529, Taiwan
7 Research Center for Applied Sciences, Academia Sinica, Taipei 11529, Taiwan
Biomicrofluidics (2014) 8, 052102
SAMCO ICP Etch System was used for microchannel fabrication on fused silica glass substrates.
For more details of our glass dry etch technologies (SiO2, fused silica and quartz), please visit the page below.
SiO2 Dry Etching Process (RIE or ICP-RIE)
Scientific Paper on Fluorescence Detection Device Fabrication Using a-Si PECVD Process by AIST, Japan
Heterogeneously integrated laser-induced fluorescence detection devices: Integration of an excitation source
Toshihiro Kamei, Keiko Sumitomo, Sachiko Ito, Ryo Takigawa, Noriyuki Tsujimura, Hisayuki Kato, Takeshi Kobayashi and Ryutaro Maeda
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan
Japanese Journal of Applied Physics (2014) 53, 06JL02
P-doped, undoped and B-doped a-Si:H film deposition were performed using SAMCO PECVD System for microfluidic device fabrication.