Date : April 10 – 11, 2018
Location : Sheraton Brussels Airport Hotel, Brussels, Belgium

CS International is one of the largest conference on compound semiconductor device and process technologies.
As a process innovator of compound semiconductor materials such as InP, GaAs and GaN,
Samco joins the conference and holds an exhibition booth.

In this year, our target process technologies are
1. InP ridge profile etching for laser diode fabrication
2. GaAs mesa profile etching for VCSEL fabrication
3. GaN etching for laser diode and power device fabrication

We would be happy to discuss more details to solve your process challenges in device fabrication.

When: March 14 – 16, 2018

Where: Shanghai New International Expo Centre, China

Booth: 2511

Visit Samco booth at SEMICON China 2018.

This year we will focus on these topics with new booth design.
· Compound semiconductor etching such as InP, GaAs and GaN
· Silicon Deep RIE for MEMS device fabrication
· SiO₂/SiN_x PECVD
· AlO_x/SiO₂ ALD
· Depassivation for failure analysis

If you’re interested in meeting with us, contact us to make an appointment.