Category: Other Materials Etch

21 Aug

Scientific paper on transparent conductive oxide solar cell by Tokyo Institute of Technology

Samco 2017 Customer, Other Materials Etch, SAMCO Customer Publication

Optically-rough and physically-flat TCO substrates for superstrate-type thin-film solar cells: Sol-gel Zn1−xMgxO coating on reaction-ion etched glass substrates

Lei Meng and Shinsuke Miyajima
Department of Electrical and Electronic Engineering, School of Engineering, Tokyo Institute of Technology, 2-12-1-NE-17, Ookayama, Meguro-ku, Tokyo, Japan
Solar Energy Materials and Solar Cells 2017 172, pp 230-237
Optically-rough and physically-flat transparent conductive oxides (TCO) substrates were created on glass substrates to promote light absorption of solar cells. Al doped Zn1−xMgxO (AZMO) transparent conductive thin film was etched in CFx based plasma using Samco RIE etcher RIE-10NR. The effects of gas mixture composition on etch rate was investigated.

Samco offers multiple types of RIE etchers from tabletop to 450 mm for various applications (plasma etching, photoresist ashing and plasma treatment). For more information on Samco RIE etcher lineup, please visit the product page below.
RIE Etcher (from tabletop to 450 mm)

RIE-10NR

21 Jun

Scientific paper on diamond power device fabrication from NIMS, Japan

Samco 2017 Customer, Diamond Etch, Other Materials Etch, Power Devices, SAMCO Customer Publication

Deposition of TiO2/Al2O3 bilayer on hydrogenated diamond for electronic devices: Capacitors, field-effect transistors, and logic inverters

J. W. Liu1, M. Y. Liao1, M. Imura1, R. G. Banal1, and Y. Koide2
1 Research Center for Functional Materials, National Institute for Materials Science (NIMS), 1-1 Namiki,
Tsukuba, Ibaraki 305-0044, Japan
2 Research Network and Facility Services Division, NIMS, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
JOURNAL OF APPLIED PHYSICS 121, 224502 (2017)

Diamond-based power devices are expected to see emerging applications which require high breakdown voltage. In this paper, MOSFET, MOS capactors and MOS logic inverter were fabricated using hydro-generated diamond.
Plasma etching of H-diamond channel layer was performed using Samco RIE etcher, RIE-200NL. Samco offers several plasma etching systems for customers who actively working on diamond power device research. For more details of plasma etching systems for diamond etching, please visit the product pages below.

RIE Plasma Etcher
ICP Etcher

21 May

Scientific paper on hydrogenated diamond MOSFET by NIMS, Japan

Samco 2017 Customer, Diamond Etch, Other Materials Etch, SAMCO Customer Publication

Enhancement-mode hydrogenated diamond metal-oxide-semiconductor field-effect transistors with Y2O3 oxide insulator grown by electron beam evaporator

J. W. Liu1 H. Oosato2 M. Y. Liao1 and Y. Koide3
1 Research Center for Functional Materials, National Institute for Materials Science (NIMS), 1-1 Namiki,
Tsukuba, Ibaraki 305-0044, Japan
2 Nanofabrication Platform, NIMS, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
3 Research Network and Facility Services Division, NIMS, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
APPLIED PHYSICS LETTERS 110, 203502 (2017)

Hydrogenated diamond-based MOSFET is a promising next-generation power device as well as SiC- or GaN-based devices. The device research on this material is still under development.
In this paper, H-diamond MOSFET with an Y2O3 oxide insulator was fabricated. Samco RIE etcher, RIE-200NL was used for mesa etching of H-diamond layer.

Samco RIE etchers offer diamond plasma etching process solutions for emerging power device research communities. For more details on our equipment lineup and specifications, please visit the product page below.
RIE Etcher for R&D and Production

If you are interested in diamond etching processes, please visit the process data page below.
Diamond Plasma Etching

RIE plasma etcher

01 Mar

Scientific Paper on Gold Nanoslit Fabrication Using PMMA Etching from Fudan University Team

Samco 2017 Customer, Other Materials Etch, PMMA Etch, SAMCO Customer Publication

A novel PMMA/NEB bilayer process for sub-20 nm gold nanoslits by a selective electron beam lithography and dry etch

Xiaqi Huanga, Jinhai Shaoa, ChialinTsoua, Sichao Zhanga, Bingrui Lua, Ling Haob, Yan Sunc, and Yifang Chena
a Nanolithogrophy and Application Research Group, State Key Lab of ASIC and System, School of Information Science and Engineering, Fudan University, Shanghai 200433, China
b National Physical Laboratory, Teddington TW11 0LW, UK
c National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, China
Microelectronic Engineering (2017) 172, Pages 13-18

Gold nanoslit structures were fabricated using process parameter optimization of electron beam lithography and dry etching. Samco plasma etcher RIE-10NR was used for dry etching of PMMA layer in oxygen plasma treatment.

22 Dec

Scientific Paper on Boron-doped Diamond Electrode Fabrication by Tokyo University of Science

Samco 2016 Customer, Diamond Etch, Other Materials Etch, SAMCO Customer Publication

Hierarchically nanostructured boron-doped diamond electrode surface

Takeshi Kondoa, b, c, Keita Yajimaa, Tsuyoshi Katoa, Masahiro Okanod, Chiaki Terashimab, c, Tatsuo Aikawaa, Masanori Hayaseb, d, Makoto Yuasaa, b, c

a Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
b Research Institute for Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
c ACT-C/JST, 4-1-8 Honcho, Kawaguchi, Saitama 333-0012, Japan
d Department of Mechanical Engineering, Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
Diamond and Related Materials (2016)
A boron-doped diamond (BDD) electrode with a large specific surface area was fabricated. The combination of thermal treatment and whisker formation by diamond plasma etching was employed for nano-texturing of diamond surfaces. Samco open-load Reactive Ion Etcher, RIE-10NR was used for diamond plasma etching process.

Diamond Plasma Etching

For more details of our diamond plasma etching technologies and capabilities, please visit the process data page below.
Diamond Plasma Etching (RIE and ICP Etch)

10 Nov

Scientific Paper on Polymer Waveguide Modulator Fabrication Using TiO2 Plasma Etching from Kyushu University Team

Samco 2016 Customer, Other Materials Etch, Photonic Devices, SAMCO Customer Publication, TiO2 Etch

An electro-optic polymer-cladded TiO2 waveguide modulator

Feng Qiu1 Hiroki Miura2, Andrew M. Spring1, Jianxun Hong1, Daisuke Maeda3, Masa-aki Ozawa3, Keisuke Odoi3 and Shiyoshi Yokoyama1,2
1 Institute for Materials Chemistry and Engineering, Kyushu University, 6-1 Kasuga-koen Kasuga-city, Fukuoka 816-8580, Japan
2 Department of Molecular and Material Sciences, Kyushu University, 6-1 Kasuga-koen Kasuga-city, Fukuoka 816-8580, Japan
3 Nissan Chemical Industries, Ltd., 2-10-1 Tuboi Nishi, Funabashi, Chiba 274-8507, Japan
Appl. Phys. Lett. (2016) 109, 173301

TiO2 Periodic Table

Waveguide modulator device using organic electro-optic (EO) materials was studied in this research. Samco ICP plasma etcher was used for slot structure formation for TiO2 plasma etching in fluorine chemistry during device fabrication.

25 Oct

Scientific Paper on Diamond MOSFET Fabrication Using Diamond Plasma Etching by NIMS, Japan

Samco 2016 Customer, Diamond Etch, Other Materials Etch, Power Devices, SAMCO Customer Publication

Design and fabrication of high-performance diamond triple-gate field-effect transistors

Jiangwei Liu 1, Hirotaka Ohsato 2, Xi Wang 1, Meiyong Liao 3 & Yasuo Koide 4
1 International Center for Young Scientists, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan.
2 Nanofabrication Platform, NIMS, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan.
3 Optical and Electronic Materials Unit, NIMS, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan.
4 Research Network and Facility Services Division, NIMS, 1-2-1 Sengen, Tsukuba, Ibaraki, 305-0047, Japan.
Scientific Reports 6, Article number: 34757 (2016)

Diamond is considered to be a material for next-geneDiamond Periodic Tableration power semiconductor devices due to high thermal conductivity and breakdown voltage. In this research, triple-gate metal-oxide-semiconductor field-effect transistor (MOSFET) device was fabricated using a hydrogenated diamond (H-diamond) substrate. In device fabrication, Samco open-load Reactive Ion Etching (RIE) system at National Institute for Materials Science (NIMS) was used for diamond plasma etching to form a diamond mesa structure.

For our process capabilities of diamond plasma etching, please visit the process data page below.
Diamond Plasma Etching Process Data (RIE Etching & ICP Etching)
Also, for more information on process equipment which are suitable for diamond plasma etching, please visit the product page below,
Reactive Ion Etching (RIE) Systems
ICP Etching Systems

22 May

Scientific Paper on Nanostructure Fabrication Using a Carbon Nanotube Template From Korea University

Samco 2016 Customer, CNT Etch, Other Materials Etch, SAMCO Customer Publication

Sub-5 nm nanostructures fabricated by atomic layer deposition using a carbon nanotube template

Ju Yeon Woo1, Hyo Han1, Ji Weon Kim1, Seung-Mo Lee2, Jeong Sook Ha3, Joon Hyung Shim1 and Chang-Soo Han1
1 School of Mechanical Engineering, Korea University Anam-Dong, Seongbuk-Gu, Seoul 136-713, Korea
2 Department of Nanomechanics, Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM), 156 Gajungbuk-ro, Yuseong-gu, Daejeon 305-343, Korea
3 Department of Chemical & Biological Engineering, Korea University Anam-Dong, Seongbuk-Gu, Seoul 136-713, Korea
Nanotechnology (2016) 27 265301 (7pp)

Samco RIE system was used for removal of single-walled carbon nanotubes (CNT) in an oxygen plasma.

30 Apr

Scientific Paper on Organic Semiconducting Oligomer Crystals from Kyoto Institute of Technology

Samco 2016 Customer, Other Materials Etch, Resist, SAMCO Customer Publication

Optically and electrically excited emissions from organic semiconducting oligomer crystals

Shu Hotta
Faculty of Materials Science and Engineering, Kyoto Institute of Technology, Sakyo-ku, Kyoto, Japan
Polymer International 2016

Samco ICP etch system was used for PDMS mold fabrication to etch away UV-curable photoresist.

20 Apr

Scientific Paper on Resin Patterning Using Plasma Etching from Toyama Prefectural University, Japan

Samco 2016 Customer, Other Materials Etch, Resist, SAMCO Customer Publication

Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography

Satoshi Takei and Makoto Hanabata
Toyama Prefectural University, Imizu, Toyama 939-0398, Japan
Appl. Phys. Express (2016) 9 056501

Samco tabletop Reactive Ion Etching (RIE) System was used for evaluation of resist materials on plasma etch selectivity. Resin etching process was performed using fluorine chemistry.

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