Category: Graphene Etch
Mariana C. Prado1, Deep Jariwala2, Tobin J. Marks2,3 and Mark C. Hersam2,3
1 Departamento de Física, Universidade Federal de Minas Gerais, Av. Antônio Carlos, 6627, 31270-901 Belo Horizonte, Brazil
2 Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA
3 Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA
Appl. Phys. Lett. (2013) 102, 193111
Samco RIE System at Northwestern University was used for investigation of reactive ion etching process of graphene.
Samco RIE systems are versatile tools for plasma etching of various materials including Si, SiO2, SiNx, metal, polymer and carbon-based materials.
For more information on our RIE system, please visit the product page below.
RIE Etching Systems