Sub-5 nm nanostructures fabricated by atomic layer deposition using a carbon nanotube template

Ju Yeon Woo¹, Hyo Han¹, Ji Weon Kim1, Seung-Mo Lee², Jeong Sook Ha³, Joon Hyung Shim¹ and Chang-Soo Han^1
1 School of Mechanical Engineering, Korea University Anam-Dong, Seongbuk-Gu, Seoul 136-713, Korea
² Department of Nanomechanics, Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM), 156 Gajungbuk-ro, Yuseong-gu, Daejeon 305-343, Korea
³ Department of Chemical & Biological Engineering, Korea University Anam-Dong, Seongbuk-Gu, Seoul 136-713, Korea
Nanotechnology (2016) 27 265301 (7pp)

Samco RIE system was used for removal of single-walled carbon nanotubes (CNT) in an oxygen plasma.

Optically and electrically excited emissions from organic semiconducting oligomer crystals

Shu Hotta
Faculty of Materials Science and Engineering, Kyoto Institute of Technology, Sakyo-ku, Kyoto, Japan
Polymer International 2016

Samco ICP etch system was used for PDMS mold fabrication to etch away UV-curable photoresist.

Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography

Satoshi Takei and Makoto Hanabata
Toyama Prefectural University, Imizu, Toyama 939-0398, Japan
Appl. Phys. Express (2016) 9 056501

Samco tabletop Reactive Ion Etching (RIE) System was used for evaluation of resist materials on plasma etch selectivity. Resin etching process was performed using fluorine chemistry.

Plasmonic arrays of titanium nitride nanoparticles fabricated from epitaxial thin films

Shunsuke Murai, Koji Fujita, Yohei Daido, Ryuichiro Yasuhara, Ryosuke Kamakura, and Katsuhisa Tanaka
Shunsuke Murai^1,2 Koji Fujita^1,3> Yohei Daido¹ Ryuichiro Yasuhara¹ Ryosuke Kamakura¹ and Katsuhisa Tanaka^1
1 Department of Material Chemistry, Graduate School of Engineering, Kyoto University, Katsura, Nishikyo-ku, Kyoto 615-8510, Japan.
Optics Express Vol. 24, Issue 2, pp. 1143-1153 (2016) •doi: 10.1364/OE.24.001143

Titanium Nitiride (TiN) nanoparticle arrays were fabricated using nanoimprint technologies.
For nanoimprint mold fabrication, Samco deep silicon etching system at Kyoto University was used for nanostructure fabrication on silicon molds. After transferring of the silicon mold pattern to photoresist on TiN substrate, Samco ICP etching system at Kyoto University was used for TiN dry etching over photoresist to fabricate TiN nanoparticle arrays.

ITO-Based MEMS Sensor Electrode for Dynamic Cow-Rumen pH Sensing

Lan Zhang¹, Jian Lu¹, Hirofumi Nogami^{1, 2}, Hironao Okada², Toshihiro Itoh^{1, 3}

¹ Research Center for Ubiquitous MEMS and Micro Engineering (UMEMSME), National Institute of Advanced Industrial Science and Technology (AIST)
² Department of Mechanical Engineering, Kyushu University
³ Department of Human and Engineered Environmental Studies, the University of Tokyo
IEEJ Transactions on Sensors and Micromachines (2016) 136, No. 11 P 482-487
A PH sensor was fabricated combining a metal-oxide-semiconductor field-effect transistor (MOSFET) with a separate sensing electrode made of indium tin oxide (ITO) film. Samco RIE etch system was used for plasma etching of an amorphous fluoropolymer CYTOP fluoropolymer film in device fabrication.

Novel Nano-Device to Measure Voltage-Driven Membrane Transporter Activity

Rikiya Watanabe, Naoki Soga, and Hiroyuki Noji
Dept. of Appl. Chem., Univ. of Tokyo, Tokyo, Japan
IEEE TRANSACTIONS ON NANOTECHNOLOGY (2016) 15, NO. 1

SAMCO open-load Reactive Ion Etching Tool was used for patterning of carbon-fluorine hydrophobic polymer (CYTOP) by dry etching of the layer against photoresist.

Calculation and fabrication of two-dimensional complete photonic bandgap structures composed of rutile TiO2 single crystals in air/liquid

Sachiko Matsushita¹, Akihiro Matsutani², Yasushi Morii¹, Daito Kobayashi¹, Kunio Nishioka², Dai Shoji², Mina Sato², Tetsu Tatsuma³, Takumi Sannomiya¹, Toshihiro Isobe¹, Akira Nakajima^1
1 Department of Metallurgy & Ceramics Science, Graduate School of Science & Technology, Tokyo Institute of Technology, 2-12-1-S7-8, Ookayama, Meguro-ku, Tokyo, 152-8552, Japan
² Technical Department, Semiconductor and MEMS Processing Center, Tokyo Institute of Technology, 4259-R2-3 Nagatsuta, Midori-ku, Yokohama, 226-8503, Japan
³ Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo, 153-8505, Japan
Journal of Materials Science (2016) Volume 51, Issue 2, pp 1066-1073

Titanium Dioxide (TiO₂) photonic crystal structure was fabricated using Samco Reactive Ion Etch (RIE) system using fluorine chemistry. Two-dimensional photonic band gaps of the TiO₂ structure were theoretically and experimentally studied.

Go to Nakajima & Matushita Lab, Tokyo Institute of Technology

Ambipolar light-emitting organic single-crystal transistors with a grating resonator

Kenichi Maruyama¹, Kosuke Sawabe², Tomo Sakanoue¹, Jinpeng Li¹, Wataru Takahashi¹, Shu Hotta³, Yoshihiro Iwasa⁴ & Taishi Takenobu^1
1Department of Applied Physics, Graduate School of Advanced Science and Engineering, Waseda University, Tokyo 169-8555, Japan.
²Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan.
³Faculty of Materials Science and Engineering Kyoto Institute of Technology, Kyoto 606-8585, Japan.
⁴Quantum-Phase Electronics Center and Department of Applied Physics, The University of Tokyo, Tokyo 113-8656, Japan, RIKEN Center for Emergent Matter Science (CEMS), Wako 351-0198, Japan.
Scientific Reports 5, Article number: 10221 (2015)
doi:10.1038/srep10221

Samco ICP etcher was used for dry etching of UV-curable resist and α,ω-bis(biphenylyl)terthiophene (BP3T) single-crystal in UV-nanoimprint lithography process for electrically driven organic laser fabrication.

Electrophoretic displays driven by all-oxide thin-film transistor backplanes fabricated using a solution process

Satoshi Inoue, Tue Trong Phan, Tomoko Hori, Hiroaki Koyama and Tatsuya Shimoda
Green Device Research Center, Japan Advanced Institute of Science and Technology, Ishikawa 923-1211, Japan
physica status solidi (a) Volume 212, Issue 10, pages 2133–2140, October 2015

Samco ICP etching system was used for plasma etching of the Ruthenium Oxide (RuO₂), Zr-In-Zn-O (ZIZO), Silicon Dioxide (SiO₂) and Indium Tin Oxide (ITO) films.

Our process capabilites of SiO₂ dry etching can be found in the page below.
SiO₂ Dry Etching Process (RIE or ICP-RIE)

Patterning of light-extraction nanostructures on sapphire substrates using nanoimprint and ICP etching with different masking materials

Hao Chen, Qi Zhang and Stephen Y Chou
Nanostructure Laboratory, Department of Electrical Engineering, Princeton University, Princeton, NJ
08544, USA
Nanotechnology (2015) 26 085302 (8pp)

Samco ICP etching system, RIE-200iP was used for recipe optimization of sapphire nanopatterning to improve light extraction of LEDs.

For our process capabilities on Sapphire plasma etching, please visit the process data page below.
Sapphire Dry Etching Process (ICP-RIE)