Category: PMMA Etch
A novel PMMA/NEB bilayer process for sub-20 nm gold nanoslits by a selective electron beam lithography and dry etch
Xiaqi Huanga, Jinhai Shaoa, ChialinTsoua, Sichao Zhanga, Bingrui Lua, Ling Haob, Yan Sunc, and Yifang Chena
a Nanolithogrophy and Application Research Group, State Key Lab of ASIC and System, School of Information Science and Engineering, Fudan University, Shanghai 200433, China
b National Physical Laboratory, Teddington TW11 0LW, UK
c National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, China
Microelectronic Engineering (2017) 172, Pages 13-18
Gold nanoslit structures were fabricated using process parameter optimization of electron beam lithography and dry etching. Samco plasma etcher RIE-10NR was used for dry etching of PMMA layer in oxygen plasma treatment.
Yan Xuana Xu Guoa Yushuang Cuia Changsheng Yuana Haixiong Gea Bo Cuib and Yanfeng Chena
a National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing, 210093, China
b Department of Electrical and Computer Engineering, University of Waterloo, 200 University Avenue, West Waterloo, Ontario N2L3G1, Canada
Soft Matter (2012) 8, 9603
SAMCO RIE Plasma Etching System was used for plasma etching of silicon-containing resist and PMMA to fabricate wrinkled films.