Category: Resist

30 Apr

Scientific Paper on Organic Semiconducting Oligomer Crystals from Kyoto Institute of Technology

Samco 2016 Customer, Other Materials Etch, Resist, SAMCO Customer Publication

Optically and electrically excited emissions from organic semiconducting oligomer crystals

Shu Hotta
Faculty of Materials Science and Engineering, Kyoto Institute of Technology, Sakyo-ku, Kyoto, Japan
Polymer International 2016

Samco ICP etch system was used for PDMS mold fabrication to etch away UV-curable photoresist.

20 Apr

Scientific Paper on Resin Patterning Using Plasma Etching from Toyama Prefectural University, Japan

Samco 2016 Customer, Other Materials Etch, Resist, SAMCO Customer Publication

Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography

Satoshi Takei and Makoto Hanabata
Toyama Prefectural University, Imizu, Toyama 939-0398, Japan
Appl. Phys. Express (2016) 9 056501

Samco tabletop Reactive Ion Etching (RIE) System was used for evaluation of resist materials on plasma etch selectivity. Resin etching process was performed using fluorine chemistry.

22 Jul

Scientific Paper on Light Emitting Transistor Fabrication by Waseda University Team

Samco 2015 Customer, Other Materials Etch, Photonic Devices, Resist, SAMCO Customer Publication

Ambipolar light-emitting organic single-crystal transistors with a grating resonator

Kenichi Maruyama1, Kosuke Sawabe2, Tomo Sakanoue1, Jinpeng Li1, Wataru Takahashi1, Shu Hotta3, Yoshihiro Iwasa4 & Taishi Takenobu1
1Department of Applied Physics, Graduate School of Advanced Science and Engineering, Waseda University, Tokyo 169-8555, Japan.
2Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan.
3Faculty of Materials Science and Engineering Kyoto Institute of Technology, Kyoto 606-8585, Japan.
4Quantum-Phase Electronics Center and Department of Applied Physics, The University of Tokyo, Tokyo 113-8656, Japan, RIKEN Center for Emergent Matter Science (CEMS), Wako 351-0198, Japan.
Scientific Reports 5, Article number: 10221 (2015)

Samco ICP etcher was used for dry etching of UV-curable resist and α,ω-bis(biphenylyl)terthiophene (BP3T) single-crystal in UV-nanoimprint lithography process for electrically driven organic laser fabrication.

31 Dec

Scientific Paper on High-aspect-ratio Nanoimprinted Structure Fabrication from National Tsing Hua University

Samco 2013 Customer, Other Materials Etch, Resist, SAMCO Customer Publication

High-aspect-ratio nanoimprinted structures for a multi-pole magnetic scale

Zhi-Hao Xu1, Chien-Li1, Cheng-Kuo1, Sheng-Ching3 and Tsung-Shune Chin2
Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu 30013, TAIWAN
Department of Materials Science & Engineering, Feng Chia University, Taichung 40724, TAIWAN
Department of Mechanical Engineering, National United University, Miaoli 36003, TAIWAN
Microsystem Technologies (2014) 20, 10, pp 1949-1953

SAMCO Plasma Cleaner was used for photoresist stripping/trimming in high-aspect-ratio structure.

For more details of our photoresist stripping & removal process solutions, please visit the page below.
Plasma Ashing & Stripping of Photoresist

11 Nov

Scientific Paper on Wrinkled PDMS Film Fabrication from Nanjing University, China

Samco 2012 Customer, Other Materials Etch, PMMA Etch, Resist, SAMCO Customer Publication

Crack-free controlled wrinkling of a bilayer film with a gradient interface

Yan Xuana Xu Guoa Yushuang Cuia Changsheng Yuana Haixiong Gea Bo Cuib and Yanfeng Chena
National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing, 210093, China
Department of Electrical and Computer Engineering, University of Waterloo, 200 University Avenue, West Waterloo, Ontario N2L3G1, Canada
Soft Matter (2012) 8, 9603

SAMCO RIE Plasma Etching System was used for plasma etching of silicon-containing resist and PMMA to fabricate wrinkled films.