Faculty of Materials Science and Engineering, Kyoto Institute of Technology, Sakyo-ku, Kyoto, Japan
Polymer International 2016
Samco ICP etch system was used for PDMS mold fabrication to etch away UV-curable photoresist.
Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography
Satoshi Takei and Makoto Hanabata
Toyama Prefectural University, Imizu, Toyama 939-0398, Japan
Appl. Phys. Express (2016) 9 056501
Samco tabletop Reactive Ion Etching (RIE) System was used for evaluation of resist materials on plasma etch selectivity. Resin etching process was performed using fluorine chemistry.
Kenichi Maruyama1, Kosuke Sawabe2, Tomo Sakanoue1, Jinpeng Li1, Wataru Takahashi1, Shu Hotta3, Yoshihiro Iwasa4 & Taishi Takenobu1
1Department of Applied Physics, Graduate School of Advanced Science and Engineering, Waseda University, Tokyo 169-8555, Japan.
2Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan.
3Faculty of Materials Science and Engineering Kyoto Institute of Technology, Kyoto 606-8585, Japan.
4Quantum-Phase Electronics Center and Department of Applied Physics, The University of Tokyo, Tokyo 113-8656, Japan, RIKEN Center for Emergent Matter Science (CEMS), Wako 351-0198, Japan.
Scientific Reports 5, Article number: 10221 (2015)
Samco ICP etcher was used for dry etching of UV-curable resist and α,ω-bis(biphenylyl)terthiophene (BP3T) single-crystal in UV-nanoimprint lithography process for electrically driven organic laser fabrication.
Scientific Paper on High-aspect-ratio Nanoimprinted Structure Fabrication from National Tsing Hua University
Zhi-Hao Xu1, Chien-Li1, Cheng-Kuo1, Sheng-Ching3 and Tsung-Shune Chin2
1 Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu 30013, TAIWAN
2 Department of Materials Science & Engineering, Feng Chia University, Taichung 40724, TAIWAN
3 Department of Mechanical Engineering, National United University, Miaoli 36003, TAIWAN
Microsystem Technologies (2014) 20, 10, pp 1949-1953
SAMCO Plasma Cleaner was used for photoresist stripping/trimming in high-aspect-ratio structure.
For more details of our photoresist stripping & removal process solutions, please visit the page below.
Plasma Ashing & Stripping of Photoresist
Yan Xuana Xu Guoa Yushuang Cuia Changsheng Yuana Haixiong Gea Bo Cuib and Yanfeng Chena
a National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing, 210093, China
b Department of Electrical and Computer Engineering, University of Waterloo, 200 University Avenue, West Waterloo, Ontario N2L3G1, Canada
Soft Matter (2012) 8, 9603
SAMCO RIE Plasma Etching System was used for plasma etching of silicon-containing resist and PMMA to fabricate wrinkled films.