Category: Samco Customer Publication
Effect of oxygen terminated surface of boron-doped diamond thin-film electrode on seawater salinity sensing
Dan Shi a,b, Lusheng Liu a, Zhaofeng Zhai a, Bin Chen a,b, Zhigang Lu a,b, Chuyan Zhang a,c, Ziyao Yuan a,b, Meiqi Zhou a,b, Bing Yang a , Nan Huang a and Xin Jiang a,c
a Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, 110016, China
b School of Materials Science and Engineering, University of Science and Technology of China, Shenyang, 110016, China
c Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Str. 9-11, Siegen, 57076, Germany
Journal of Materials Science & Technology, Volume 86, Pages 1-10 (2021)
Boron-doped diamond is an interesting material for sensing application. Samco open-load RIE system RIE-10NR was used for patterning and surface treatment in oxygen plasma.
Scientific Paper on TiN on Si hybrid-plasmonic-photonic waveguide from Virginia Commonwealth University
A Platform for CMOS Compatible Plasmonics: High Plasmonic Quality Titanium Nitride Thin Films on Si (001) with an MgO Interlayer
Kai Ding 1, Dhruv Fomra 1, Alexander V. Kvit 2, Hadis Morkoç 1, Nathaniel Kinsey 1, Ümit Özgür 1 and Vitaliy Avrutin 1
1 Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond, Virginia, 23284 USA
2 Materials Science Center, University of Wisconsin‐Madison, Madison, WI, 53706 USA
Advanced Photonics Research, 2000210 (2021)
A CMOS compatible hybrid-plasmonic-photonic waveguide was fabricated using TiN layer deposited by PEALD on Si (001) substrate with MgO interlayer. Samco ICP-RIE system RIE-101iPH was used for TiN/Au etching in chlorine chemistry and also Si etching in fluorine chemistry.
For more details of our ICP-RIE etch systems, please visit the product page below.
ICP-RIE Etch Systems
Ralf K. Heilmann,1 Alexander R. Bruccoleri,2 Jungki Song,1 Mark L. Schattenburg1
1MIT Kavli Institute for Astrophysics and Space Research (United States)
2Izentis LLC (United States)
Proc. SPIE 11119, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX, 1111913 (9 September 2019); https://doi.org/10.1117/12.2529354
Samco Si DRIE Equipment was used for 200 nm-period grating Si deep etching (6 µm).
Hironori Okumura1 and Taketoshi Tanaka2
1 Faculty of Pure and Applied Science, University of Tsukuba, Tsukuba 305-8573, Japan
2 Rohm Co. Ltd., Kyoto 615-8585, Japan
Japanese Journal of Applied Physics, 58, 120902 (2019)
Ga2O3 is a compound semiconductor material with a large band-gap energy. Research on this material is still early stage, but more researchers are getting interested in unique material properties. Dry etching and wet etching of β-Ga2O3 was studied in this paper. Samco ICP-RIE system RIE-400iP was used for mesa structure fabrication in ICP etching of chlorine chemistry.
Profile control of compound semiconductor materials is one of our strong points in material processing. We have accumulated process knowledge on GaN, GaAs, InP, Ga2O3, etc.
If you would like to see some process data, please visit the following webpage.
Process Data by Materials
Pseudo-Infected Red Blood Cell Beads as Positive Control for Cell Microarray Chip–Based Detection of Plasmodium-Infected RBCs
Muneaki Hashimoto 1, Masahiko Numata 2, Shouki Yatsushiro 1, Yusuke Ido 1, Masato Tanaka 1, Kazuaki Kajimoto 1, and Masatoshi Kataoka 1
1 Health Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 2217-14, Hayashi-cho, Takamatsu, Kagawa 761-0301, Japan.
2 National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba, Ibaraki 305-8563, Japan.
A cell microarray chip was fabricated to detect detect red blood cells (RBCs) infected with the causative agent of malaria, Plasmodium. In this research, Samco RIE system was used for hydrophilic surface treatment of the microarray devices.
Samco plasma equipment is widely used not only for conventional semiconductor device research but also for biomedical research field. Plasma treatment technology is useful for wettability improvement of surfaces for cell adhesion and stable liquid flow inside fine micro-channels. Aqua Plasma®, unique plasma treatment technology is beneficial for super-hydrophilic surfaces and direct bonding of polymer substrates such as COP (cyclo-olefin polymer) and COC (cyclo-olefin polymer). Please check process solution page below for more details.
Yuanhui Fang, Jian Zhang, Yu-Long Jiang
School of Microelectronics, Fudan University, Shanghai 200433, China
2018 18th International Workshop on Junction Technology (IWJT), Shanghai, 2018, pp. 1-3.
Samco RIE Plasma Etching Equipment was used for tungsten etching and SiO2 etching with the tungsten hardmask.
A VHF temperature compensated lithium niobate-on-oxide resonator with Q > 3900 for low phase noise oscillators
Grace W. Fanga, Gayathri Pillaib, Ming-Huang Lic, Chun-You Liua, Sheng-Shian Lia
a Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, Taiwan
b Institute of NanoEngineering and MicroSystems, National Tsing Hua University, Hsinchu, Taiwan
c MNTL, University of Illinois at Urbana Champaign, Urbana, IL, USA
2018 IEEE Micro Electro Mechanical Systems (MEMS), Belfast, 2018, pp. 723-726.
LiNbO3-based resonator with high Q over 3900 was fabricated in this research. Samco Reactive Ion Etching Tool was used for LiNbO3 etching with SiO2 in chlorine-based chemistry.
Samco is capable of high-quality plasma etching processes of various materials. Please see our process data page for more details.
Plasma Etching & PECVD Process Data
Celluloid Microenclosure and Microlens Array Fabricated by Suzukiʼs Universal Microprinting Method and XeF2 Vapor Etching for Microbial Analysis
Akihiro Matsutani1 and Ayako Takada2
1 Semiconductor and MEMS Processing Division, Technical Department, Tokyo Institute of Technology,
4259 Nagatsuta, Yokohama, Kanagawa 226-8503, Japan
2 Biomaterials Analysis Division, Technical Department, Tokyo Institute of Technology,
4259 Nagatsuta, Yokohama, Kanagawa 226-8501, Japan
Sensors and Materials, Vol. 30, No. 1 (2018) 149–155
A celluloid-based biochip for cell trapping is fabricated using Suzuki’s universal microprinting (SUMP) method. Samco tabletop Reactive Ion Etching (RIE) system was used for mold fabrication. Si layer was etched over photoresist and Cr mask in fluorine chemistry.
For more information on our RIE system lineup, please visit the product page below.
Yoshihiro Kawata, Kazuki Aoki, Yuhi Inada*, Takeshi Yamao, and Shu Hotta
Faculty of Materials Science and Engineering, Kyoto Institute of Technology, Kyoto 606-8585, Japan
Japanese Journal of Applied Physics 57, 03EH11 (2018)
In this paper, direct fabrication of gratings was performed on HMDS-treated SiO2/Si substrates. Samco plasma etching system at Kyoto Institute of Technology was used for plasma etching of SiO2/Si substrates for grating fabrication over an organic semiconducting oligomer 5,5AA-bis(4-biphenylyl)-2,2A:5A,2AA-terthiophene (BP3T). The system was also used for estimate of BP3T etch resistivity.
Nanofabrication of 10-nm T-shaped gates using a double patterning process with electron beam lithography and dry etch
Jinhai Shao1, Jianan Deng1, W. Lu2 and Yifang Chen1
1Fudan University (China), 2Ohio State University (United States)
J. of Micro/Nanolithography, MEMS, and MOEMS, 16(3), 033508 (2017).
T-shaped gates with the footprint scaling down to 10 nm were fabricated using a double patterning procedure (electron beam lithography and dry etching). Samco Reactive Ion Etching Tool RIE-10NR was used for pattern transfer of metal nanoslit on SiNx layer in fluorine-based chemistry.