Category: 2009 Customer
Shu Zhen1, Wan Jing1, Lu Bingrui1, Xie Shenqi1, Chen Yifang2., Qu Xinping1 and Liu Ran1
1 State Key Laboratory of ASIC and System, Department of Microelectronics, Fudan University, Shanghai 200433, China
2 Micro and Nanotechnology Centre, Rutherford Appleton Laboratory, Chilton, Didcot, Oxon, OX11 0QX, UK
Journal of Semiconductors (2009) 30, 6
SAMCO RIE Plasma Etching System was used for patterning of SiNx film (SiNx plasma etching) with high aspect ratio and vertical sidewalls.
J. H. Leach, M. Wu, X. Ni, X. Li, Ü . Ö zgür, and H. Morkoç
Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond VA, 23284, USA
Phys. Status Solidi A, 207: 211–216 (2009).
The field effect transistors were fabricated using Ti/Al/Ni/Au Ohmic contacts followed by etched mesa isolation in a Samco ICP Etch System RIE-101iPH using a Cl-based chemistry.
Virginia Commonwealth University is one of Samco customers using our ICP etch system for AlGaN and GaN plasma etching processes in GaN-based power device fabrication.
Virginia Commonwealth University Microelectronics Materials & Device Laboratory website
Northwestern University is a proud customer of SAMCO RIE system, RIE-10NR. The system is used for various types of research including device fabrication.