Category: 2012 Customer
Yan Xuana Xu Guoa Yushuang Cuia Changsheng Yuana Haixiong Gea Bo Cuib and Yanfeng Chena
a National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing, 210093, China
b Department of Electrical and Computer Engineering, University of Waterloo, 200 University Avenue, West Waterloo, Ontario N2L3G1, Canada
Soft Matter (2012) 8, 9603
SAMCO RIE Plasma Etching System was used for plasma etching of silicon-containing resist and PMMA to fabricate wrinkled films.
Scientific Paper on AlN Nanocavity Fabrication Using AlN Plasma Etching from the University of Tokyo
S. Sergent1, M. Arita1, S. Kako1, K. Tanabe1, S. Iwamoto1,2 and Y. Arakawa1,2
1 Institute for Nano Quantum Information Electronics, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
2 Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
Appl. Phys. Lett. 101, 101106 (2012)
AlN nanopattern was fabricated by AlN plasma etching using Samco ICP etch system to improve the quality factor of nanobeam cavities.
For more information on our ICP etching sytems, please visit the product page below.
Samco ICP Plasma Etcher
Transparent Electrode Materials for Simultaneous Amperometric Detection of Exocytosis and Fluorescence Microscopy
Kassandra Kisler1, Brian N. Kim1, Xin Liu2, Khajak Berberian1, Qinghua Fang1, Cherian J. Mathai3, Shubhra Gangopadhyay3, Kevin D. Gillis2,4, and Manfred Lindau1
1 School of Applied and Engineering Physics, Cornell University, Ithaca, NY USA
2 Dalton Cardiovascular Research Center, University of Missouri, Columbia, MO USA
3 Department of Electrical and Computer Engineering, University of Missouri, Columbia, MO USA
4 Departments of Biological Engineering and Medical Pharmacology and Physiology, University of Missouri, Columbia, MO USA
J Biomater Nanobiotechnol. 2012 ; 3(2A): 243–253.
Samco UV-Ozone cleaner at Cornell University was used for photoresist descum in sample preparation.
Our UV-Ozone cleaners are equipped with stage heating and ozone generator, and they enable high-speed photoresist ashing & stripping. The processes can be applied for photoresist decsum application. For more information on our UV-Ozone cleaners, please visit the product page below.
UV-Ozone Cleaners (Table-top & Production Models)
M. Wienold, A. Tahraoui, L. Schrottke, R. Sharma, X. Lü, K. Biermann, R. Hey, and H. T. Grahn
Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany
Optics Express Vol.20, Issue 10, pp. 11207-11217 (2012)
SAMCO ICP Etching System was used for GaAs/AlGaAs dry etching over SiO2 mask in fabrication of Terahertz quantum-cascade lasers (THz QCLs).
For our capabilities of GaAs dry etching, please visit the process data page below.
GaAs Dry Etching Process (ICP-RIE)