Crack-free controlled wrinkling of a bilayer film with a gradient interface

Yan Xuan^a Xu Guo^a Yushuang Cui^a Changsheng Yuan^a Haixiong Ge^a Bo Cui^b and Yanfeng Chen^a
a National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing, 210093, China
^b Department of Electrical and Computer Engineering, University of Waterloo, 200 University Avenue, West Waterloo, Ontario N2L3G1, Canada
Soft Matter (2012) 8, 9603

SAMCO Plasma Etching System (RIE etcher) was used for plasma etching of silicon-containing resist and PMMA to fabricate wrinkled films.

High-Q AlN photonic crystal nanobeam cavities fabricated by layer transfer

S. Sergent¹, M. Arita¹, S. Kako¹, K. Tanabe¹, S. Iwamoto^1,2 and Y. Arakawa^1,2
1 Institute for Nano Quantum Information Electronics, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
² Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
Appl. Phys. Lett. 101, 101106 (2012)

AlN nanopattern was fabricated by AlN plasma etching using Samco ICP etch system to improve the quality factor of nanobeam cavities.

For more information on our ICP etching sytems, please visit the product page below.
Samco ICP Plasma Etcher

Transparent Electrode Materials for Simultaneous Amperometric Detection of Exocytosis and Fluorescence Microscopy

Kassandra Kisler¹, Brian N. Kim¹, Xin Liu², Khajak Berberian¹, Qinghua Fang¹, Cherian J. Mathai³, Shubhra Gangopadhyay³, Kevin D. Gillis^2,4, and Manfred Lindau^1
1 School of Applied and Engineering Physics, Cornell University, Ithaca, NY USA
² Dalton Cardiovascular Research Center, University of Missouri, Columbia, MO USA
³ Department of Electrical and Computer Engineering, University of Missouri, Columbia, MO USA
⁴ Departments of Biological Engineering and Medical Pharmacology and Physiology, University of Missouri, Columbia, MO USA
J Biomater Nanobiotechnol. 2012 ; 3(2A): 243–253.

Samco UV-Ozone cleaner at Cornell University was used for photoresist descum in sample preparation.

Our UV-Ozone cleaners are equipped with stage heating and ozone generator, and they enable high-speed photoresist ashing & stripping. The processes can be applied for photoresist decsum application. For more information on our UV-Ozone cleaners, please visit the product page below.
UV-Ozone Cleaners (Table-top & Production Models)

Lateral distributed-feedback gratings for single-mode, high-power terahertz quantum-cascade lasers

M. Wienold, A. Tahraoui, L. Schrottke, R. Sharma, X. Lü, K. Biermann, R. Hey, and H. T. Grahn
Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany
Optics Express Vol.20, Issue 10, pp. 11207-11217 (2012)

SAMCO ICP Etching System was used for GaAs/AlGaAs dry etching over SiO₂ mask in fabrication of Terahertz quantum-cascade lasers (THz QCLs).

For our capabilities of GaAs dry etching, please visit the process data page below.
GaAs Dry Etching Process (ICP-RIE)