Category: 2012 Customer

11 Nov

Scientific Paper on Wrinkled PDMS Film Fabrication from Nanjing University, China

Samco 2012 Customer, Other Materials Etch, PMMA Etch, Resist, SAMCO Customer Publication

Crack-free controlled wrinkling of a bilayer film with a gradient interface

Yan Xuana Xu Guoa Yushuang Cuia Changsheng Yuana Haixiong Gea Bo Cuib and Yanfeng Chena
National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing, 210093, China
Department of Electrical and Computer Engineering, University of Waterloo, 200 University Avenue, West Waterloo, Ontario N2L3G1, Canada
Soft Matter (2012) 8, 9603

SAMCO RIE Plasma Etching System was used for plasma etching of silicon-containing resist and PMMA to fabricate wrinkled films.

27 Oct

Scientific Paper on AlN Nanocavity Fabrication Using AlN Plasma Etching from the University of Tokyo

Samco 2012 Customer, AlN Etch, Other Materials Etch, Photonic Devices, SAMCO Customer Publication

High-Q AlN photonic crystal nanobeam cavities fabricated by layer transfer

S. Sergent1, M. Arita1, S. Kako1, K. Tanabe1, S. Iwamoto1,2 and Y. Arakawa1,2
1 Institute for Nano Quantum Information Electronics, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
2 Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
Appl. Phys. Lett. 101, 101106 (2012)

AlN nanopattern was fabricated by AlN plasma etching using Samco ICP etch system to improve the quality factor of nanobeam cavities.

AlN plasma etching

For more information on our ICP etching sytems, please visit the product page below.
Samco ICP Plasma Etcher

29 Jun

Scientific Paper on Transparent Microelectrode Fabrication from Cornell University Team

Samco 2012 Customer, SAMCO Customer Publication, Surface Treatment, UV-Ozone

Transparent Electrode Materials for Simultaneous Amperometric Detection of Exocytosis and Fluorescence Microscopy

Kassandra Kisler1, Brian N. Kim1, Xin Liu2, Khajak Berberian1, Qinghua Fang1, Cherian J. Mathai3, Shubhra Gangopadhyay3, Kevin D. Gillis2,4, and Manfred Lindau1
1 School of Applied and Engineering Physics, Cornell University, Ithaca, NY USA
2 Dalton Cardiovascular Research Center, University of Missouri, Columbia, MO USA
3 Department of Electrical and Computer Engineering, University of Missouri, Columbia, MO USA
4 Departments of Biological Engineering and Medical Pharmacology and Physiology, University of Missouri, Columbia, MO USA
J Biomater Nanobiotechnol. 2012 ; 3(2A): 243–253.

Samco UV-Ozone cleaner at Cornell University was used for photoresist descum in sample preparation.

Our UV-Ozone cleaners are equipped with stage heating and ozone generator, and they enable high-speed photoresist ashing & stripping. The processes can be applied for photoresist decsum application. For more information on our UV-Ozone cleaners, please visit the product page below.
UV-Ozone Cleaners (Table-top & Production Models)

07 May

Scientific Paper on Quantum-Cascade Laser Using GaAs Dry Etching by Paul-Drude-Institut

Samco 2012 Customer, AlGaAs Etch, Compound Semi Etch, GaAs Etch, Photonic Devices, SAMCO Customer Publication

Lateral distributed-feedback gratings for single-mode, high-power terahertz quantum-cascade lasers

M. Wienold, A. Tahraoui, L. Schrottke, R. Sharma, X. Lü, K. Biermann, R. Hey, and H. T. Grahn
Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany
Optics Express Vol.20, Issue 10, pp. 11207-11217 (2012)

SAMCO ICP Etching System was used for GaAs/AlGaAs dry etching over SiO2 mask in fabrication of Terahertz quantum-cascade lasers (THz QCLs).

Periodic Table GaAs

For our capabilities of GaAs dry etching, please visit the process data page below.
GaAs Dry Etching Process (ICP-RIE)

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