Category: 2015 Customer
Sun-Kyung Kim† Xing Zhang‡ David J. Hill‡ Kyung-Deok Song§ Jin-Sung Park§ Hong-Gyu Park§ and James F. Cahoon‡
†Department of Applied Physics, Kyung Hee University, Gyeonggi-do 446-701, Republic of Korea
‡Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States
§Department of Physics, Korea University, Seoul 136-701, Republic of Korea
Nano Lett. 2015, 15, 753−758
Samco UV-Ozone cleaner, UV-1 was used for SU-8 stripping in nanowire-based device fabrication.
Bulk vertical micromachining of single-crystal sapphire using inductively coupled plasma etching for x-ray resonant cavities
P-C Chen1, P-T Lin1, D G Mikolas1, Y-W Tsai2, Y-L Wang1, C-C Fu1 and S-L Chang2
1 Institute of Nano Engineering and Microsystems, National Tsing-Hua University, No. 101, Kuang-fu Rd, Sec. II, Hsinchu 300, Taiwan
2 Department of Physics, National Tsing-Hua University, No. 101, Kuang-fu Rd, Sec. II, Hsinchu 300, Taiwan
J. Micromech. Microeng. (2015) 25 015016
Samco ICP Etching System was used for the recipe optimization of sapphire plasma etching in x-ray resonant cavity fabrication.
For our process capabilities of sapphire plasma etching, please visit the page below.
Sapphire Dry Etching Process (ICP-RIE)