Category: SAMCO Customer Publication

13 Oct

Scientific Paper on High Quality InAlN/AlN/GaN HFET from Virginia Commonwealth University

Samco 2009 Customer, Compound Semi Etch, GaN Etch, Power Devices, SAMCO Customer Publication

Effect of lattice mismatch on gate lag in high quality InAlN/AlN/GaN HFET structures

J. H. Leach, M. Wu, X. Ni, X. Li, Ü . Ö zgür, and H. Morkoç
Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond VA, 23284, USA
Phys. Status Solidi A, 207: 211–216 (2009).

The field effect transistors were fabricated using Ti/Al/Ni/Au Ohmic contacts followed by etched mesa isolation in a Samco ICP Etch System RIE-101iPH using a Cl-based chemistry.

Virginia Commonwealth University is one of Samco customers using our ICP etch system for AlGaN and GaN plasma etching processes in GaN-based power device fabrication.
Virginia Commonwealth University Microelectronics Materials & Device Laboratory website

28 Oct

Scientific Paper on GaSb Dry Etching Process Development by University of Delaware

Samco 2008 Customer, Compound Semi Etch, GaSb Etch, SAMCO Customer Publication

Inductively coupled plasma etching of III–V antimonides in BCl3/SiCl4 etch chemistry

K. Swaminathan⁎, P.E. Janardhanan, O.V. Sulima
Department of Electrical and Computer Engineering, University of Delaware, Newark, Delaware 19716, USA
Thin Solid Films (2008) 516, Issue 23, 1 October 2008, Pages 8712–8716

Inductively coupled plasma etching process of GaSb was investigated using Samco ICP etch system.
Etch rate of 4 μm/min was achieved over photoresist mask.

For more information on our ICP etch systems, please visit the product page below.
ICP Plasma Etcher

gasb dry etching

24 Oct

Scientific Paper on FeSi2 Plasma Etching from University of Tsukuba

Samco 2006 Customer, FeSi2 Etch, Other Materials Etch, SAMCO Customer Publication

Reactive Ion Etching of β-FeSi2 with Inductively Coupled Plasma

Takayuki Wakayama, Takashi Suemasu, Tomomi Kanazawa and Hiroyuki Akinaga
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
Jpn. J. Appl. Phys. (2006) 45 L569

Samco ICP-RIE etcher was used for plasma etch recipe development of β-FeSi2 on a silicon substrate using fluorine chemistry.
High etch selectivity of β-FeSi2 against silicon was investigated.

fesi2 plasma etching

Please visit our product page for more details of our ICP plasma etch systems.
ICP Plasma Etch Systems for Si, SiO2, III-V & Metal

13 Jul

Scientific Paper on GaInAsP/InP Photonic Crystal Lasers Using InP Etching by Yokohama National University

Samco 2003 Customer, Compound Semi Etch, InP Etch, Photonic Devices, SAMCO Customer Publication

Fabrication of GaInAsP/InP photonic crystal lasers by ICP etching and control of resonant mode in point and line composite defects

Kyoji Inoshita and Toshihiko Baba
Department of Electrical & Computer Engineering, Yokohama National University, Japan

Samco ICP plasma etcher was used for InP plasma etching in GaInAsP/InP photonic crystal laser fabrication.

inp etching
For more details on our InP plasma etching technologies, please visit the process data page below.
InP Plasma Etching

06 May

Testimonial from Optoelectronics Company in Fremont, CA

Samco 2002 Customer, SAMCO Customer Publication

SAMCO UV-Ozone Cleaners are used for surface cleaning of substrates in device fabrication. This is testimonial from optoelectronics company in Fremont, CA.

The SAMCO UV-1 is a very simple-to-use system and can be effectively integrated into a controlled environment. The system’s internal cavity is leak tight at atmospheric conditions. The system is ideal for accomplishing two goals. First of all, it does an excellent job for treating bond surfaces. Our epoxy spreads about 30% more after the treatment. Secondly, the system is ideal for baking out moisture in the salts we use.

09 Oct

Testimonial from U.S. Naval Research Laboratory in Washington, DC

Samco 2001 Customer, SAMCO Customer Publication

U.S. Naval Research Lab, Wahington, DC is a proud customer of SAMCO UV-Ozone cleaner, UV-1. This is testimonial from the user.

The SAMCO UV-1 Cleaning system arrived in a very good shape and was well-packaged. It was purchased on recommendation from another group here at NRL that considers its cleaning action essential for silicon wafer bonding. We plan to make the UV-Ozone cleaning part of a standard procedure prior to deposition of self-assembled organic monolayers. The transaction went very smoothly and we would be pleased to work with SAMCO again.