Category: SAMCO Customer Publication
J. H. Leach, M. Wu, X. Ni, X. Li, Ü . Ö zgür, and H. Morkoç
Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond VA, 23284, USA
Phys. Status Solidi A, 207: 211–216 (2009).
The field effect transistors were fabricated using Ti/Al/Ni/Au Ohmic contacts followed by etched mesa isolation in a Samco ICP Etch System RIE-101iPH using a Cl-based chemistry.
Virginia Commonwealth University is one of Samco customers using our ICP etch system for AlGaN and GaN plasma etching processes in GaN-based power device fabrication.
Virginia Commonwealth University Microelectronics Materials & Device Laboratory website
Northwestern University is a proud customer of SAMCO RIE system, RIE-10NR. The system is used for various types of research including device fabrication.
K. Swaminathan⁎, P.E. Janardhanan, O.V. Sulima
Department of Electrical and Computer Engineering, University of Delaware, Newark, Delaware 19716, USA
Thin Solid Films (2008) 516, Issue 23, 1 October 2008, Pages 8712–8716
Inductively coupled plasma etching process of GaSb was investigated using Samco ICP etch system.
Etch rate of 4 μm/min was achieved over photoresist mask.
For more information on our ICP etch systems, please visit the product page below.
ICP Plasma Etcher
Takayuki Wakayama, Takashi Suemasu, Tomomi Kanazawa and Hiroyuki Akinaga
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
Jpn. J. Appl. Phys. (2006) 45 L569
Samco ICP-RIE etcher was used for plasma etch recipe development of β-FeSi2 on a silicon substrate using fluorine chemistry.
High etch selectivity of β-FeSi2 against silicon was investigated.
Please visit our product page for more details of our ICP plasma etch systems.
ICP Plasma Etch Systems for Si, SiO2, III-V & Metal
Scientific Paper on GaInAsP/InP Photonic Crystal Lasers Using InP Etching by Yokohama National University
Fabrication of GaInAsP/InP photonic crystal lasers by ICP etching and control of resonant mode in point and line composite defects
Kyoji Inoshita and Toshihiko Baba
Department of Electrical & Computer Engineering, Yokohama National University, Japan
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS (2003) 9, NO. 5, SEPTEMBER/OCTOBER
Samco ICP plasma etcher was used for InP plasma etching in GaInAsP/InP photonic crystal laser fabrication.
For more details on our InP plasma etching technologies, please visit the process data page below.
InP Plasma Etching
SAMCO UV-Ozone Cleaners are used for surface cleaning of substrates in device fabrication. This is testimonial from optoelectronics company in Fremont, CA.
The SAMCO UV-1 is a very simple-to-use system and can be effectively integrated into a controlled environment. The system’s internal cavity is leak tight at atmospheric conditions. The system is ideal for accomplishing two goals. First of all, it does an excellent job for treating bond surfaces. Our epoxy spreads about 30% more after the treatment. Secondly, the system is ideal for baking out moisture in the salts we use.
U.S. Naval Research Lab, Wahington, DC is a proud customer of SAMCO UV-Ozone cleaner, UV-1. This is testimonial from the user.
The SAMCO UV-1 Cleaning system arrived in a very good shape and was well-packaged. It was purchased on recommendation from another group here at NRL that considers its cleaning action essential for silicon wafer bonding. We plan to make the UV-Ozone cleaning part of a standard procedure prior to deposition of self-assembled organic monolayers. The transaction went very smoothly and we would be pleased to work with SAMCO again.