Category: Surface Treatment
On-chip cell analysis platform: Implementation of contact fluorescence microscopy in microfluidic chips
Hiroaki Takehara1, Osawa Kazutaka2, Makito Haruta2, Toshihiko Noda2, Kiyotaka Sasagawa2, Takashi Tokuda2 and Jun Ohta2
1 Department of Materials Engineering, Graduate School of Engineering, The University of Tokyo, 2-11-16, Yayoi, Bunkyo-ku, Tokyo 113-8656, Japan
2 Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama-cho, Ikoma, Nara 630-0192, Japan
AIP Advances 7, 095213 (2017)
In this research, on-chip cell analysis platform for integrating contact fluorescence microscopy was performed using microfluidic chips. In microfluidic device fabrication, PDMS and ultra-thin glass substrates were bonded using exposure to oxygen plasma. Samco RIE etcher was used for oxygen plasma treatment of the substrates.
Samco offers plasma treatment technologies for microfluidics fabrication. Unique plasma processes enable plasma bonding of substrates such as COP and glass without microchannel pattern collapse because there is no need to implement mechanical pressing and heating for bonding. For more details, please visit the process page below.
Plasma Treatment & Bonding for Polymer Microfluidics
Scientific paper on low-temperature annealing of InGaZnO transistors by Nara Institute of Science and Technology
Low temperature (150°C) wet oxygen annealing of amorphous InGaZnO thin-film transistors for flexible device applications
M. P. Jallorina, J. P. Bermundo, Y. Ishikawa and Y. Uraoka
Nara Institute of Science and Technology, Graduate School of Materials Science, 8916-5 Takayama, Ikoma, Nara 630-0192 Japan
2017 24th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD), Kyoto, Japan, 2017, pp. 203-204.
Low-temperature processing is required in flexible polymer device fabrication because temperature setting is limited by native melting temperature of polymer materials. In this research, several methods of ultraviolet (UV), ozone (O3) and wet oxygen (Wet O2) were compared to investigate the effects on the device performance. Samco UV-ozone cleaner UV-1 was used for UV, ozone or UV-ozone processes. The results show that UV & O3 annealing at 150°C has higher mobility. Samco UV-ozone cleaners are equipped with stage heating (up to 300degC) and ex-situ ozone generator to promote generation of reactive atomic oxygen in thermal ozone dissociation. For more details of our UV-ozone technologies, please visit the product page.
Samco UV-Ozone Cleaner (Tabletop & Production Models)
Naoji Matsuhisa1, Daishi Inoue2, Peter Zalar1,3, Hanbit Jin1, Yorishige Matsuba1,3, Akira Itoh1,3, Tomoyuki Yokota1,3, Daisuke Hashizume2 and Takao Someya1,2,3,4
1Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan.
2Center for Emergent Matter Science (CEMS), RIKEN, 2-1 Hirosawa, Wako, Saitama 351-0198, Japan.
3Exploratory Research for Advanced Technology (ERATO), Japan Science and Technology Agency (JST), 2-11-16, Yayoi, Bunkyo-ku, Tokyo 113-0032, Japan.
4Thin-Film Device Laboratory, RIKEN, 2-1 Hirosawa, Wako, Saitama 351-0198, Japan.
Nature Materials 16, 834–840 (2017)
Someya lab at the University of Tokyo is famous for printable and stretchable electronics for healthcare and wearable device applications. In this research, silver nanoparticles were used as conductive materials in flexible sensor and actuator networks, expecting large-area manufacturing using printing technologies. In the fabrication of stretchable pressure and temperature sensor, Samco UV-ozone cleaner UV-1 was used for UV curing of photoresist PSR-301A. Samco offers multiple systems of surface treatment (plasma cleaning and UV-ozone cleaning) for device fabrication and material research.
Hydrophilic-treated plastic plates for wide-range analysis of Giemsa-stained red blood cells and automated Plasmodium infection rate counting
Muneaki Hashimoto1, Shouki Yatsushiro1, Shohei Yamamura1, Masato Tanaka1, Hirokazu Sakamoto1,3, Yusuke Ido1, Kazuaki Kajimoto1, Mika Bando2, Jun‑ichi Kido2 and Masatoshi Kataoka1
1Health Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 2217‑14, Hayashi‑cho, Takamatsu, Kagawa 761‑0301, Japan.
2Department of Periodontology and Endodontology, Institute of Health Biosciences, The University of Tokushima Graduate School, Institute of Health Biosciences, 3‑18‑15 Kuramoto, Tokushima 770‑8504, Japan.
Malar J (2017) 16 321
As a new method of malaria diagnostics, the count of Plasmodium spp. cells in red blood cells (RBCs) using hydrophilic-treated cyclic olefn copolymer (COC) plates was proposed. Oxygen plasma treatment was applied to COC plates in order to modify the surface wettability to hydrophilic using Samco RIE plasma etching system RIE-10NR.
Polymer surface modification is an essential technique to achieve surface wettability improvement and direct substrate bonding in microfluidics fabrication. We offer plasma cleaners and UV-ozone cleaners as well as plasma etching equipment for this application. The paper below shows long-term stable hydrophilic surfaces of polymer materials (PMMA, COC, COP and PEEK) using UV-ozone treatment technologies.
UV/ozone Surface Modification for Long-term Stable Hydrophilic Surface of Polymer Microfluidic Devices
Magnesium Oxide (MgO) pHsensitive Sensing Membrane in Electrolyte-Insulator Semiconductor Structures with CF4 Plasma Treatment
Chyuan-Haur Kao1,3,4, Chia Lung Chang1, Wei Ming Su2, Yu Tzu Chen2, Chien Cheng Lu2,
Yu Shan Lee2, Chen Hao Hong2, Chan-Yu Lin4 & Hsiang Chen2
1 Department of Electronic Engineering, Chang Gung University, Taoyuan, 333, Taiwan, ROC.
2 Department of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli, 545, Taiwan, ROC.
3 Kidney Research Center, Department of Nephrology, Chang Gung Memorial Hospital, Chang Gung University, College of Medicine, Taoyuan, Taiwan, ROC.
4 Department of Electronic Engineering, Ming Chi University of Technology, New Taipei City,
Scientific Reports (2017) 7 7185 DOI:10.1038/s41598-017-07699-3
In this paper, MgO (Magnesium Oxide) based biosensors were fabricated for chemical solution sensing with high pH sensitivity. CF4 plasma treatment was carried out to shape nanostructures and stabilize the material properties of the MgO membrane. For the CF4 plasma treatment of MgO films and deposition of silicon based films, Samco PECVD system PD-220N was used.
Samco offers PECVD systems for plasma deposition of SiO2, SiNx, a-Si, DLC and etc. These films are used for passivation, barrier film and other purposes in various research fields. For more details of our process capabilities of plasma deposition technologies, please visit the process data pages below.
SiO2 PECVD Process Data
SiNx PECVD Process Data
Difference in growth and coalescing patterns of droplets on bi-philic surfaces with varying spatial distribution
Martand Mayukh Garimella, Sudheer Koppu, Shantanu Shrikant Kadlaskar, Venkata Pillutla, Abhijeet, Wonjae Choi
Department of Mechanical Engineering, University of Texas at Dallas, 800 W. Campbell Road, Richardson, TX 75080
Journal of Colloid and Interface Science (2017)
In this paper, surface wettability patterning was performed, and unique water droplet motion on the patterned regions was investigated. Samco UV-ozone cleaner, UV-1 at UT Dallas was used for complete native oxide removal after hydrofluoric acid treatment.
Surface wettability modulation (hydrophilic and hydrophobic) is fundamental for material research and device fabrication. Samco is developing surface treatment processes using UV-ozone technologies and plasma technologies. If you are interested in our latest material processing technologies and publication, please visit the page below.
Material Processing Data
Consequences of plasma oxidation and vacuum annealing on the chemical properties and electron accumulation of In2O3 surfaces
Theresa Berthold1, Julius Rombach2 Thomas Stauden1 Vladimir Polyakov3
Volker Cimalla3 Stefan Krischok1 Oliver Bierwagen2 and Marcel Himmerlich1
1 Institut fur Mikro- und Nanotechnologien MacroNano, Technische Universit€at Ilmenau, PF 100565, 98684 Ilmenau, Germany
2 Paul-Drude-Institut fur Festk€orperelektronik, Hausvogteiplatz 5–7, 10117 Berlin, Germany
3 Fraunhofer-Institut fur Angewandte Festk€orperphysik, Tullastraße 72, 79108 Freiburg, Germany
Journal of Applied Physics 120, 245301 (2016)
Indium Oxide (In2O3) is used for metal contacts of electronic devices. It is known that defects (oxygen vacancies) and impurities (adsorbates) of In2O3 films change electron concentration. In previous papers, surface treatment techniques using plasma technologies were investigated to reduce the defects and impurities of In2O3 films.
In this paper, Samco ICP plasma etching tool at Paul-Drude-Institut was used for plasma surface oxidation of In2O3, and the samples were treated by subsequent vacuum annealing. It was found that oxygen plasma treatment reduced adsorbed carbon impurities and removed surface defect states, attributed to oxygen vacancies.
Marko J. Tadjerz, Nadeemullah A. Mahadik, Virginia D. Wheeler, Evan R. Glaser, Laura Ruppalt, Andrew D. Koehler, Karl D. Hobart, Charles R. Eddy Jr. and Fritz J. Kub
United States Naval Research Laboratory, Washington, DC 20375, USA
ECS J. Solid State Sci. Technol. 2016 volume 5, issue 9, P468-P470
Gallium Oxide (Ga2O3) is a wide bandgap material with high breakdown voltage, and it is a promising material for power device applications. Compared to other wide bandgap materials such as Silicon Carbide (SiC) and Gallium Nitride (GaN), the device research using this material is still primitive. However, β-Ga2O3 substrates are commercially available, and more and more researchers are getting interested in its unique material properties.
Here, β-Ga2O3 MOSFET was fabricated using commercially available β-Ga2O3 substrates. Samco UV-Ozone Cleaner at United States Naval Research Laboratory was used for surface cleaning of SiO2/Si substrate in sample preparation.
Scientific Paper on Organic Rectifying Diode Fabrication Using Gold Plasma Treatment by University of Tokyo
A Mechanically Durable and Flexible Organic Rectifying Diode with a Polyethylenimine Ethoxylated Cathode
Naoji Matsuhisa, Hiroaki Sakamoto, Tomoyuki Yokota, Peter Zalar, Amir Reuveny, Sunghoon Lee and Takao Someya
Electrical and Electronic Engineering and Information Systems, University of Tokyo
7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
Advanced Electronic Materials Volume 2, Issue 10, October 2016
Flexible organic diode device fabrication is performed using Samco process equipment. Samco plasma cleaner PC-300 was used for wettability improvement of polyethylenimine ethoxylated (PEIE) surfaces and for work function improvement of gold (Au) electrode.
Someya lab, University of Tokyo is one of Samco plasma cleaner customers. Our plasma cleaner is used for organic transistor fabrication, and they have published several papers on cutting-edge flexible MEMS devices.
Go to Someya lab website.
Samco plasma cleaners are versatile tools for plasma treatment and cleaning of various materials. For metal surface cleaning, gold plasma treatment is one of the common surface cleaning technique before device packaging. Not only gold but also various metal materials can be processed including aluminum, silver & titanium. We have a special process technique to reduce corrosion risk of metal surfaces caused by plasma cleaning process. Furthermore, multiple shelves inside process chamber enable batch processing of several samples in one time. For more spec details of the plasma cleaners, please visit the product page below.
Benzhong Zhaoa, Christopher W. MacMinnb, and Ruben Juanesa
a Department of Civil and Environmental Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139;
b Department of Engineering Science, University of Oxford, Oxford OX1 3PJ, United Kingdom
PNAS (2016) DOI10.1073/pnas.1603387113
Fluid–fluid displacement in porous media of microfluidic flow cell was studied for potential CO2 sequestration application to solve global warming caused by the greenhouse gas.
Samco tabletop UV-ozone cleaner at MIT was used for wettability improvement of photocurable polymer NOA81 to fabricate microfluidic flow cells.
This article was featured in MIT News.
View the news article.