Category: Surface Treatment
Consequences of plasma oxidation and vacuum annealing on the chemical properties and electron accumulation of In2O3 surfaces
Theresa Berthold1, Julius Rombach2 Thomas Stauden1 Vladimir Polyakov3
Volker Cimalla3 Stefan Krischok1 Oliver Bierwagen2 and Marcel Himmerlich1
1 Institut fur Mikro- und Nanotechnologien MacroNano, Technische Universit€at Ilmenau, PF 100565, 98684 Ilmenau, Germany
2 Paul-Drude-Institut fur Festk€orperelektronik, Hausvogteiplatz 5–7, 10117 Berlin, Germany
3 Fraunhofer-Institut fur Angewandte Festk€orperphysik, Tullastraße 72, 79108 Freiburg, Germany
Journal of Applied Physics 120, 245301 (2016)
Indium Oxide (In2O3) is used for metal contacts of electronic devices. It is known that defects (oxygen vacancies) and impurities (adsorbates) of In2O3 films change electron concentration. In previous papers, surface treatment techniques using plasma technologies were investigated to reduce the defects and impurities of In2O3 films.
In this paper, Samco ICP plasma etching tool at Paul-Drude-Institut was used for plasma surface oxidation of In2O3, and the samples were treated by subsequent vacuum annealing. It was found that oxygen plasma treatment reduced adsorbed carbon impurities and removed surface defect states, attributed to oxygen vacancies.
Marko J. Tadjerz, Nadeemullah A. Mahadik, Virginia D. Wheeler, Evan R. Glaser, Laura Ruppalt, Andrew D. Koehler, Karl D. Hobart, Charles R. Eddy Jr. and Fritz J. Kub
United States Naval Research Laboratory, Washington, DC 20375, USA
ECS J. Solid State Sci. Technol. 2016 volume 5, issue 9, P468-P470
Gallium Oxide (Ga2O3) is a wide bandgap material with high breakdown voltage, and it is a promising material for power device applications. Compared to other wide bandgap materials such as Silicon Carbide (SiC) and Gallium Nitride (GaN), the device research using this material is still primitive. However, β-Ga2O3 substrates are commercially available, and more and more researchers are getting interested in its unique material properties.
Here, β-Ga2O3 MOSFET was fabricated using commercially available β-Ga2O3 substrates. Samco UV-Ozone Cleaner at United States Naval Research Laboratory was used for surface cleaning of SiO2/Si substrate in sample preparation.
Scientific Paper on Organic Rectifying Diode Fabrication Using Gold Plasma Treatment by University of Tokyo
A Mechanically Durable and Flexible Organic Rectifying Diode with a Polyethylenimine Ethoxylated Cathode
Naoji Matsuhisa, Hiroaki Sakamoto, Tomoyuki Yokota, Peter Zalar, Amir Reuveny, Sunghoon Lee and Takao Someya
Electrical and Electronic Engineering and Information Systems, University of Tokyo
7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
Advanced Electronic Materials Volume 2, Issue 10, October 2016
Flexible organic diode device fabrication is performed using Samco process equipment. Samco plasma cleaner PC-300 was used for wettability improvement of polyethylenimine ethoxylated (PEIE) surfaces and for work function improvement of gold (Au) electrode.
Someya lab, University of Tokyo is one of Samco plasma cleaner customers. Our plasma cleaner is used for organic transistor fabrication, and they have published several papers on cutting-edge flexible MEMS devices.
Go to Someya lab website.
Samco plasma cleaners are versatile tools for plasma treatment and cleaning of various materials. For metal surface cleaning, gold plasma treatment is one of the common surface cleaning technique before device packaging. Not only gold but also various metal materials can be processed including aluminum, silver & titanium. We have a special process technique to reduce corrosion risk of metal surfaces caused by plasma cleaning process. Furthermore, multiple shelves inside process chamber enable batch processing of several samples in one time. For more spec details of the plasma cleaners, please visit the product page below.
Benzhong Zhaoa, Christopher W. MacMinnb, and Ruben Juanesa
a Department of Civil and Environmental Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139;
b Department of Engineering Science, University of Oxford, Oxford OX1 3PJ, United Kingdom
PNAS (2016) DOI10.1073/pnas.1603387113
Fluid–fluid displacement in porous media of microfluidic flow cell was studied for potential CO2 sequestration application to solve global warming caused by the greenhouse gas.
Samco tabletop UV-ozone cleaner at MIT was used for wettability improvement of photocurable polymer NOA81 to fabricate microfluidic flow cells.
This article was featured in MIT News.
View the news article.
Integrated solid-state nanopore platform for nanopore fabrication via dielectric breakdown, DNAspeed deceleration and noise reduction
Yusuke Goto, Itaru Yanagi, Kazuma Matsui, Takahide Yokoi & Ken-ichi Takeda
Center for Technology Innovation – Healthcare, Research & Development Group, Hitachi Ltd.,1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan.
Scientific Reports 6, Article number: 31324 (2016) doi:10.1038/srep31324
Samco plasma cleaner was used for surface cleaning and wettability modulation of substrates with Si3N4 membranes in sample preparation.
Physical Property Evaluation of ZnO Thin Film Fabricated by Low-Temperature Process for Flexible Transparent TFT
Khafe, Adie Bin Mohd1; Watanabe, Hiraku1; Yamauchi, Hiroshi1; Kuniyoshi, Shigekazu1; Iizuka, Masaaki2; Sakai, Masatoshi1; Kudo, Kazuhiro1
1 Graduate School of Engineering, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba, 263-8522, Japan
2 Faculty of Education, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba, 263-8522, Japan
Journal of Nanoscience and Nanotechnology, Volume 16, Number 4, April 2016, pp. 3168-3175(8)
Samco UV-Ozone cleaner, UV-1 was used for ultraviolet/ozone (UV-O3) assisted thermal treatments on wet processed zinc oxide field effect transistor (ZnO-FET) to improve drain current and mobility of the ZnO-based device. They found that UV-Ozone treatment eliminated carbon impurities in ZnO thin film and improved the performance of ZnO-FET.
Surface fluorination of rutile-TiO2 thin films deposited by reactive sputtering for accelerating response of optically driven capillary effect
Taizo Kobayashi1, Hironobu Maeda2, and Satoshi Konishi3
1 Ritsumeikan-Global Innovation Research Organization, Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan
2 Graduate School of Science and Engineering, Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan
3 Department of Mechanical Engineering, Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan
Japanese Journal of Applied Physics 55, 06GP03 (2016)
TiO2 thin films with the rutile phase were fluorinated using Samco RIE system to enhance the photoresponsivity.
Unexpected Effects of the Rate of Deposition on the Mode of Growth and Morphology of Thin Films of Tetracene Grown on SiO2
R. K. Nahm and J. R. Engstrom
School of Chemical and Biomolecular Engineering, Cornell University, Ithaca, New York 14853, United States
J. Phys. Chem. C, 2016, 120 (13), pp 7183–7191
Tsuyoshi MINAMI, Tsubasa SATO, Tsukuru MINAMIKI, and Shizuo TOKITO
Research Center for Organic Electronics (ROEL), Graduate School of Science and Engineering, Yamagata
University, 4-3-16 Jonan, Yonezawa, Yamagata 992–8510, Japan
Analytical Sciences (2015) 31
An organic field-effect transistor (OFET) was fabricated for detection of biogenic amines in an aqueous solution. In device fabrication, Samco Plasma Cleaner PC-300 was used for oxygen plasma treatment of metal electrodes for surface cleaning.
For more details of our plasma cleaners, please visit the product page below.
Controlled superficial assembly of DNA–amorphous calcium phosphate nanocomposite spheres for surface-mediated gene delivery
Ayako Oyaneaa, Hiroko Arakia, Maki Nakamuraa, Yoshiki Shimizua, Quazi T.H. Shubhraa, Atsuo Itob, Hideo Tsurushimaa, c
a Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
b Health Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 6, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8566, Japan
c Department of Neurosurgery, Faculty of Medicine, University of Tsukuba, 1-1-1 Tennoudai, Tsukuba, Ibaraki 305-8575, Japan
SAMCO table-top RIE systsm was used for surface modification of polystyrene substrates in an oxygen plasma.