N2-Plasma-Assisted One-Step Alignment and Patterning of Graphene Oxide on a SiO2/Si Substrate Via the Langmuir–Blodgett Technique

Neha Chauhan, Vivekanandan Palaninathan, Sreejith Raveendran, Aby Cheruvathoor Poulose, Yoshikata Nakajima, Takashi Hasumura, Takashi Uchida, Tatsuro Hanajiri, Toru Maekawa and D. Sakthi Kumar
Bio-Nano Electronics Research Centre, Graduate School of Interdisciplinary New Science, Toyo University, Kawagoe, Saitama, Japan
Advanced Materials Interfaces 2015 (5)

Samco basic plasma research kit was used for surface modification of SiO2/Si in nitrogen plasma for selective placement and patterning of monolayer Graphene Oxide.