Identifying DNA methylation in a nanochannel

Xiaoyin Sun^a,b, Takao Yasui^a,b,c, Takeshi Yanagida^d,e, Noritada Kaji^a,b, Sakon Rahong^a,b, Masaki Kanai^d, Kazuki Nagashima^d, Tomoji Kawai^e and Yoshinobu Baba^a,b,f
a Department of Applied Chemistry, Graduate School of Engineering, Nagoya University, Nagoya, Japan;
^b ImPAC T Research Center for Advanced Nanobiodevices, Nagoya University, Nagoya, Japan;
^c Japan Science and Technology Agency (JST), PRESTO, Saitama, Japan;
^d Institute of Materials Chemistry and Engineering, Kyushu University, Fukuoka, Japan;
^e Institute of Scientific and Industrial Research, Osaka University, Osaka, Japan;
^f Health Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Takamatsu, Japan
Science and Technology of Advanced Materials (2016) VOL . 17, NO . 1, 644–649

A new method to analyze DNA methylation was proposed using a nano-channel device in this research. Samco RIE etch tool was used for  quartz plasma etching over Cr hard mask to fabricate nano-channel structures. The nano-channel device is effective to detect single DNA molecule.

For more details of our SiO₂ (quartz) plasma etching capabilities, please visit the process data page below.
SiO₂ Plasma Etching Process (RIE and ICP Etch)