Scientific Paper on Microfluidics Fabrication Using Glass Dry Etching by National Tsing Hua University, Taiwan

September 27, 2014 Samco 2014 Customer, Microfluidics, Samco Customer Publication, Silicon/Dielectrics Etch, SiO2 Etch

DNA combing on low-pressure oxygen plasma modified polysilsesquioxane substrates for single-molecule studies

K. K. Sriram1,2,3 Chun-Ling Chang3 U. Rajesh Kumar1,4,5 and Chia-Fu Chou3,6,7
Nano Science and Technology Program, Taiwan International Graduate Program, Academia Sinica, Taipei 11529, Taiwan
Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan
Institute of Physics, Academia Sinica, Taipei 11529, Taiwan
Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 10617, Taiwan
Department of Chemistry, National Taiwan University, Taipei 10617, Taiwan
Genomics Research Center, Academia Sinica, Taipei 11529, Taiwan
Research Center for Applied Sciences, Academia Sinica, Taipei 11529, Taiwan
Biomicrofluidics (2014) 8, 052102

SAMCO ICP Etch System was used for microchannel fabrication on fused silica glass substrates.

For more details of our glass dry etch technologies (SiO2, fused silica and quartz), please visit the page below.
SiO2 Dry Etching Process (RIE or ICP-RIE)