Scientific Paper on Graphene Etching from Northwestern University

July 20, 2013 Samco 2013 Customer, Graphene Etch, Other Materials Etch, Samco Customer Publication

Optimization of graphene dry etching conditions via combined microscopic and spectroscopic analysis

Mariana C. Prado1, Deep Jariwala2, Tobin J. Marks2,3 and Mark C. Hersam2,3
1 Departamento de Física, Universidade Federal de Minas Gerais, Av. Antônio Carlos, 6627, 31270-901 Belo Horizonte, Brazil
2 Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA
3 Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA
Appl. Phys. Lett. (2013) 102, 193111

Samco RIE System at Northwestern University was used for investigation of reactive ion etching process of graphene.

Samco RIE systems are versatile tools for plasma etching of various materials including Si, SiO2, SiNx, metal, polymer and carbon-based materials.
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RIE Etching Systems