Scientific Paper on InGaAs MOSFETs Using InGaAs Plasma Etching from MIT

June 1, 2015 Samco 2015 Customer, Compound Semi Etch, InGaAs Etch, Power Devices, SAMCO Customer Publication

A CMOS-Compatible Fabrication Process for Scaled Self-Aligned InGaAs MOSFETs

Lin, J., D. A. Antoniadis, and J. A. del Alamo
presented at Compound Semiconductor Manufacturing Technology Conference (CS MANTECH), Scottsdale, AZ, May 18-21, 2015, pp. 239-242.

Samco ICP etching system, RIE-200iP was used for optimization of InGaAs/InAlAs/InP dry etching process.

Go to Prof. Jesús A. del Alamo Research Group Website

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