Scientific Paper on High-aspect-ratio Nanoimprinted Structure Fabrication from National Tsing Hua University
Zhi-Hao Xu1, Chien-Li1, Cheng-Kuo1, Sheng-Ching3 and Tsung-Shune Chin2
1 Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu 30013, TAIWAN
2 Department of Materials Science & Engineering, Feng Chia University, Taichung 40724, TAIWAN
3 Department of Mechanical Engineering, National United University, Miaoli 36003, TAIWAN
Microsystem Technologies (2014) 20, 10, pp 1949-1953
SAMCO Plasma Cleaner was used for photoresist stripping/trimming in high-aspect-ratio structure.
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Plasma Ashing & Stripping of Photoresist