Scientific Paper on High-aspect-ratio Nanoimprinted Structure Fabrication from National Tsing Hua University

December 31, 2013 Samco 2013 Customer, Other Materials Etch, Resist, Samco Customer Publication

High-aspect-ratio nanoimprinted structures for a multi-pole magnetic scale

Zhi-Hao Xu1, Chien-Li1, Cheng-Kuo1, Sheng-Ching3 and Tsung-Shune Chin2
Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu 30013, TAIWAN
Department of Materials Science & Engineering, Feng Chia University, Taichung 40724, TAIWAN
Department of Mechanical Engineering, National United University, Miaoli 36003, TAIWAN
Microsystem Technologies (2014) 20, 10, pp 1949-1953

SAMCO Plasma Cleaner was used for photoresist stripping/trimming in high-aspect-ratio structure.

For more details of our photoresist stripping & removal process solutions, please visit the page below.
Plasma Ashing & Stripping of Photoresist