Crack-free controlled wrinkling of a bilayer film with a gradient interface

Yan Xuan^a Xu Guo^a Yushuang Cui^a Changsheng Yuan^a Haixiong Ge^a Bo Cui^b and Yanfeng Chen^a
a National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing, 210093, China
^b Department of Electrical and Computer Engineering, University of Waterloo, 200 University Avenue, West Waterloo, Ontario N2L3G1, Canada
Soft Matter (2012) 8, 9603

SAMCO Plasma Etching System (RIE etcher) was used for plasma etching of silicon-containing resist and PMMA to fabricate wrinkled films.