Scientific Paper on Resin Patterning Using Plasma Etching from Toyama Prefectural University, Japan
Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography
Satoshi Takei and Makoto Hanabata
Toyama Prefectural University, Imizu, Toyama 939-0398, Japan
Appl. Phys. Express (2016) 9 056501
Samco tabletop Reactive Ion Etching (RIE) System was used for evaluation of resist materials on plasma etch selectivity. Resin etching process was performed using fluorine chemistry.