Scientific Paper on Resin Patterning Using Plasma Etching from Toyama Prefectural University, Japan

April 20, 2016 Samco 2016 Customer, Other Materials Etch, Resist, Samco Customer Publication

Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography

Satoshi Takei and Makoto Hanabata
Toyama Prefectural University, Imizu, Toyama 939-0398, Japan
Appl. Phys. Express (2016) 9 056501

Samco tabletop Reactive Ion Etching (RIE) System was used for evaluation of resist materials on plasma etch selectivity. Resin etching process was performed using fluorine chemistry.

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