Scientific Paper on Sapphire Etching from Princeton University Using SAMCO ICP Etch System

March 1, 2015 Samco 2015 Customer, LEDs, Other Materials Etch, Samco Customer Publication, Sapphire Etch

Patterning of light-extraction nanostructures on sapphire substrates using nanoimprint and ICP etching with different masking materials

Hao Chen, Qi Zhang and Stephen Y Chou
Nanostructure Laboratory, Department of Electrical Engineering, Princeton University, Princeton, NJ
08544, USA
Nanotechnology (2015) 26 085302 (8pp)

Samco ICP etching system, RIE-200iP was used for recipe optimization of sapphire nanopatterning to improve light extraction of LEDs.

Go to Chou Research Group Website

Sapphire Periodic Table

For our process capabilities on Sapphire plasma etching, please visit the process data page below.
Sapphire Dry Etching Process (ICP-RIE)

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