Scientific Paper on Fused Silica Nanofluidic Device Fabrication by National Taiwan University Team

August 6, 2016 Samco 2016 Customer, Microfluidics, Silicon/Dielectrics Etch, SiO2 Etch

Multiplexed immunosensing and kinetics monitoring in nanofluidic devices with highly enhanced target capture efficiency

Yii-Lih Lin1,2,3, Yen-Jun Huang3,4, Pattamon Teerapanich5,6, Thierry Leïchlé5,6 and Chia-Fu Chou2,3
1 Department of Chemistry, National Taiwan University, Taipei, Taiwan
2 Nano Science and Technology Program, Taiwan International Graduate Program, Academia Sinica and National Taiwan University, Taipei, Taiwan
3 Institute of Physics, Academia Sinica, Taipei, Taiwan
4 Department of Physics, National Taiwan University, Taipei, Taiwan
5 LAAS-CNRS, 7 Avenue du Colonel Roche, F-31077 Toulouse, France
6 Université de Toulouse, F-31077 Toulouse, France
Biomicrofluidics 10, 034114 (2016)

Samco ICP etch system, RIE-10iP was used for nano-slit pattern fabrication by fused quartz plasma etching.

For our process capabilities of SiO2 and quartz plasma etching, please visit the process data page below.
SiO2 Dry Etching Process (RIE or ICP-RIE)

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