Scientific paper on 200 nm-period grating Si deep etching (6 µm) by MIT Kavli Institute

March 27, 2020 Samco 2019 Customer, Samco Customer Publication

Progress in x-ray critical-angle transmission grating technology development

Ralf K. Heilmann,1 Alexander R. Bruccoleri,2 Jungki Song,1 Mark L. Schattenburg1
1MIT Kavli Institute for Astrophysics and Space Research (United States)
2Izentis LLC (United States)
Proc. SPIE 11119, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX, 1111913 (9 September 2019);

Samco Si DRIE Equipment was used for 200 nm-period grating Si deep etching (6 µm).