Scientific Paper on Microfluidics Fabrication from Nagoya University, Osaka University and AIST

July 1, 2015 Samco 2015 Customer, Microfluidics, Samco Customer Publication, Silicon/Dielectrics Etch, SiO2 Etch

Three-dimensional Nanowire Structures for Ultra-Fast Separation of DNA, Protein and RNA Molecules

Sakon Rahong1,2, Takao Yasui2,3, Takeshi Yanagida4, Kazuki Nagashima4, Masaki Kanai4,
Gang Meng4, Yong He4, Fuwei Zhuge4, Noritada Kaji2,3, Tomoji Kawai4 & Yoshinobu Baba1,2,3,5
Institute of Innovation for Future Society, Nagoya University, JAPAN.
FIRST Research Center for Innovative Nanobiodevices, Nagoya University, JAPAN.
Department of Applied Chemistry, Graduate School of Engineering, Nagoya University, JAPAN.
The Institute of Scientific and Industrial Research, Osaka University, JAPAN.
Health Research Institute, National Institute of Advanced Industrial Science and. Technology (AIST), JAPAN.
Scientific Reports 5, Article number: 10584 (2015) doi:10.1038/srep10584

SAMCO Reactive Ion Etching System RIE-10NR was used for SiO2 plasma etching over Cr mask. This process is used for micro-channel fabrication on microfluidic system which enables ultra-fast separation of biomolecules (DNA, Protein and RNA Molecules). SiO2 Periodic Table

For our process examples and capabilities of SiO2 plasma etching, please visit the process data page below.
SiO2 Dry Etching Process (RIE or ICP-RIE)

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